Micromirror Tilt Angle Regulation via Reset Sequence Adjustment

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Solution Overview

Problem

Digital micromirror devices (DMDs) face challenges in maintaining tight tolerance of micromirror rest positions, which is crucial for applications like laser illumination, short wavelength photolithography, and holography, where loose tolerance can result in poor image quality and depth of focus.

Innovation Solution

A method and system for adjusting the reset sequence of DMDs by determining a desired tilt angle, altering voltage potentials, and applying altered operating conditions to achieve precise micromirror positioning, allowing for tight tolerance adjustments without significant hardware changes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a loose tolerance of micromirror rest position (+/- 1 degree) is used, then the device complexity and manufacturing cost are reduced, but the image quality and depth of focus deteriorate in applications requiring tight tolerance

Engineering Contradiction:
Improvedevice complexityVSAvoidmicromirror rest position tolerance
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent changes the physical parameters of the micromirror device by introducing adjustable spring tips with variable stiffness and adjustable landing zones at different positions. This allows the rest position tolerance to be tuned dynamically without changing the fundamental device structure, resolving the contradiction between device simplicity and positioning precision.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent makes the micromirror rest position dynamic and adjustable rather than fixed. By allowing the spring tip stiffness and landing zone positions to be modified, the system can adapt to different application requirements for tolerance, maintaining both simplicity and precision as needed.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If multiple DMD designs are developed to support different tolerance requirements, then the manufacturing precision for specific applications is improved, but the device complexity and development costs increase

Engineering Contradiction:
Improvemicromirror rest position toleranceVSAvoidadaptability to different applications
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent creates a universal DMD design that can serve multiple applications with different tolerance requirements. The adjustable spring tips and configurable landing zones enable a single device to adapt to various precision needs, eliminating the need for multiple specialized designs and reducing development costs.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

By making key parameters (spring tip stiffness, landing zone position) adjustable, the patent allows one DMD design to cover multiple application scenarios, achieving both high precision for specific applications and broad versatility across different uses.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If tight tolerance control is implemented through hardware modifications, then the manufacturing precision is improved, but the device complexity and development time increase

Engineering Contradiction:
Improvemicromirror rest position toleranceVSAvoiddevice complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent achieves tight tolerance control by adjusting existing parameters (spring tip properties, landing zone positions) rather than introducing complex new hardware. This approach maintains manufacturing precision while avoiding significant increases in device complexity.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses software-based control and characterization to achieve precise rest position control, effectively copying the function of complex hardware adjustments through computational methods and configurable parameters.

Inventive Principle:
Principle #26Copying

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables precise control of micromirror tilt angles, improving image quality and depth of focus in various applications, allowing a single DMD design to be used across different tolerance requirements, reducing development and product costs.

Implementation Method 1

change a potential energy stored in spring tips coupled to the mirrors

Methodology Applied
Scientific EffectElastic potential energy storage: Spring

Implementation Method 2

adjustments alter a voltage potential difference between mirrors of the digital micromirror device and respective address lines

Methodology Applied
Scientific EffectElectrostatic force: Electrostatics

Data Source

PatentUS7692841B2System and method for regulating micromirror position
Publication Date: 2010.04.06 TEXAS INSTRUMENTS INC
  • US7692841B2 patent drawing
  • US7692841B2 patent drawing
  • US7692841B2 patent drawing

AI summary

A system and method for regulating micromirror position in a digital micromirror device. The system and method adjusts micromirror operating temperature and/or a reset sequence of the micromirror by determining a desired tilt angle, adjusting voltage potentials of signals in a reference reset sequence, and saving the adjusted reset sequence. The adjustments are used to alter a voltage potential difference between micromirrors of the digital micromirror device and respective address lines, thereby allowing for a precise regulation of a tilt angle of the micromirrors. Additionally, the operating temperature of the digital micromirror device may also be controlled to regulate micromirror position. The precise control of the tilt angle of the micromirrors permits the use of digital micromirror devices in systems requiring fine focus and increased focus depth, such as photolithography and holography.