Purge devices having micronozzles and operating methods thereof

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Solution Overview

Problem

Existing purge devices for semiconductors and photolithographic masks suffer from low particle removal efficiency due to unreachable zones and the risk of mechanical damage during manual operation, with wet cleaning systems requiring additional drying steps and dry systems failing to effectively cover all areas.

Innovation Solution

A purge device with a rotation platform and micronozzle array that allows for 360° rotation and adjustable movement along tracks, ensuring complete coverage and minimizing mechanical contact through controlled distance and angle, utilizing micronozzles that can slide along tracks to reach all areas of the mask.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If manual operation of filter guns is used to purge pellicles, then the purging process can be performed, but accidental damages such as scratches or penetration through the pellicles occur

Engineering Contradiction:

Improvemanual operationVSAvoidmechanical damage to pellicle

Core Design Contradiction:

Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The patent replaces manual mechanical filter gun operation with an automated robotic system that precisely controls the positioning and movement of the filter gun, eliminating human error and accidental mechanical damage to the pellicle

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system incorporates sensors and feedback mechanisms that automatically adjust the filter gun's position and purging parameters, enabling the system to self-regulate and prevent damage without human intervention

Inventive Principle:

Principle #25Self-service

2Object-affected harmful factors

If a rotatable suspension system with nitrogen knives is used to purge photolithographic masks, then mechanical damage is prevented, but some zones become unreachable and particle removal efficiency is low

Engineering Contradiction:

Improvemechanical damage preventionVSAvoidparticle removal efficiency

Core Design Contradiction:

Object-affected harmful factorsVSProductivity

Solution Approach 1:

The patent employs a robotic system with multiple degrees of freedom that dynamically adjusts the filter gun's position and orientation, enabling access to all zones of the photolithographic mask while maintaining safe distances to prevent mechanical damage

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The robotic system integrates multiple functions including precise positioning, angle adjustment, and purging operations in a single platform, enabling comprehensive coverage of all mask zones without mechanical contact

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Productivity

If a wet cleaning system with rotatable device is used to remove pollutants, then particle removal efficiency is improved, but additional blow-drying steps are required and the system complexity increases

Engineering Contradiction:

Improveparticle removal efficiencyVSAvoidsystem complexity

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The patent uses compressed gas (pneumatic method) through the filter gun to remove particles and chemicals from the photolithographic mask, eliminating the need for liquid cleaning and subsequent drying steps, thereby reducing system complexity and processing time

Inventive Principle:

Principle #29Pneumatics and hydraulics

4Device complexity

If fixed nozzles are used in a rotatable device, then the structure is simple, but some zones on photolithographic masks remain unreachable

Engineering Contradiction:

Improvestructure simplicityVSAvoidcoverage area

Core Design Contradiction:

Device complexityVSArea of stationary object

Solution Approach 1:

The patent replaces fixed nozzles with a robotic filter gun system that dynamically positions itself in three-dimensional space, allowing the purging operation to reach all zones of the photolithographic mask while maintaining a relatively simple overall structure

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances particle removal efficiency by covering all areas of the photolithographic masks while protecting them from mechanical damage, eliminating the need for additional drying steps and improving overall cleaning effectiveness.

Implementation Method 1

The purge device utilizes a rotatable device to purge photolithographic masks. The rotatable device utilizes centrifugal force to rapidly remove pollutants and chemical purgers on the subjects.

Methodology Applied

Scientific EffectPneumatic force: Pressure Gradient

Implementation Method 2

The rotatable device utilizes centrifugal force to rapidly remove pollutants and chemical purgers on the subjects.

Methodology Applied

Scientific EffectCentrifugal force: Centrifugal Force

Data Source

PatentUS9737915B2Purge devices having micronozzles and operating methods thereof

Publication Date: 2017.08.22 GUDENG EQUIP CO LTD

AI summary

The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean pellicles used in semiconductor manufacturing. The purge devices having micronozzles comprises a base, at least one track configured on the base, a rotation platform, and a micronozzle array, in which the micronozzle array further comprises an air duct and a plurality of nozzles. Additionally, the rotation platform and the micronozzle array are able to move relatively to another along the at least one track.