Microplasma Array Resonators for Uniform Large-Area Processing
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Solution Overview
Problem
Existing microplasma generators are limited in their ability to generate plasma over a large area, making them ineffective for industrial processes that require surface alteration of substrates, as their geometries are not optimized for wide-area processing and scaling up linear arrays results in plasma generation issues near the edges.
Innovation Solution
A microplasma generator array comprising dielectric substrates with conductive strips and a ground plane, where the strips are arranged in a linear or two-dimensional configuration with resonators, allowing for efficient plasma generation over extended areas through resonant coupling and impedance matching, enabling uniform plasma distribution across larger surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If linear arrays of microplasma generators are scaled up to larger sizes, then the processing area is increased, but plasma generation fails near the edges of the array
Solution Approach 1:
The device is segmented into multiple independent resonating circuits arranged in an array, each capable of generating microplasma locally. This segmentation allows the system to cover large processing areas while maintaining reliable plasma generation at each segment, including edge positions, since each resonator operates independently rather than relying on a continuous large-scale structure
Solution Approach 2:
The invention transitions from one-dimensional linear arrays to two-dimensional arrays of resonating circuits. This dimensional expansion enables coverage of larger processing areas while maintaining uniform plasma distribution across the entire array, including edge regions, by distributing plasma generation sources across multiple dimensions rather than along a single line
2Manufacturing precision
If the geometry of microplasma generators is optimized for point-source plasma generation, then electron density and temperature control are improved, but the device cannot effectively process wide-area substrates
Solution Approach 1:
Multiple resonating circuits that individually provide precise plasma parameter control are merged into a coordinated array system. Each circuit maintains its ability to generate controlled microplasma while collectively covering large processing areas, achieving both precision and scalability through the combination of multiple controlled sources
Solution Approach 2:
The resonating circuit design is made universal by creating a standardized unit that can be replicated and arranged in various configurations (linear arrays, two-dimensional arrays). This universal design maintains precise plasma control capabilities while adapting to different processing area requirements through flexible array arrangements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables controlled and tunable microplasma generation over larger areas, improving the effectiveness of industrial processes by maintaining uniform plasma distribution and extending the applicability of microplasma technology to broader industrial applications.
Implementation Method 1
The cold atmospheric plasma is generated by coupling microwave energy (0.4-2.4 GHz) to plasma electrons using a resonating circuit
Implementation Method 2
The microplasma is generated in a discharge gap, e.g., 25 μm, formed in a ring-shaped microstrip transmission line. The cold atmospheric plasma is generated by coupling microwave energy (0.4-2.4 GHz) to plasma electrons using a resonating circuit
Implementation Method 3
A microplasma generator array comprising dielectric substrates with conductive strips and a ground plane, where the strips are arranged in a linear or two-dimensional configuration with resonators, allowing for efficient plasma generation over extended areas through resonant coupling
Implementation Method 4
plasma is an ionized gas, in which electrons heated by an electric field are responsible for ionizing gas atoms
Data Source
AI summary
A microplasma generator includes first and second conductive resonators disposed on a first surface of a dielectric substrate. The first and second conductive resonators are arranged in line with one another with a gap defined between a first end of each resonator. A ground plane is disposed on a second surface of the dielectric substrate and a second end of each of the first and second resonators is coupled to the ground plane. A power input connector is coupled to the first resonator at a first predetermined distance from the second end chosen as a function of the impedance of the first conductive resonator. A microplasma generating array includes a number of resonators in a dielectric material substrate with one end of each resonator coupled to ground. A micro-plasma is generated at the non-grounded end of each resonator. The substrate includes a ground electrode and the microplasmas are generated between the non-grounded end of the resonator and the ground electrode. The coupling of each resonator to ground may be made through controlled switches in order to turn each resonator off or on and therefore control where and when a microplasma will be created in the array.