Particle Beam Microscope Hysteresis Compensation
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Solution Overview
Problem
The conventional method for adjusting a particle beam microscope is hindered by the hysteresis of the objective lens, which affects the magnetic field and results in suboptimal image quality due to assumptions about identical focusing settings.
Innovation Solution
The method involves setting the beam adjustment device and objective lens in four different settings, recording images, and determining an optimized setting that accounts for the hysteresis by calculating a third objective lens excitation value (I3) using the relation I3=I1+K*(I2−I1), where I1 and I2 are initial excitation values, and K is a predetermined value, to ensure consistent focusing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the conventional adjustment method is used assuming identical focusing settings, then the adjustment process is simplified, but the hysteresis of the objective lens causes suboptimal image quality
Solution Approach 1:
The patent changes the excitation parameter of the objective lens by applying a hysteresis compensating voltage offset. Instead of assuming identical focusing settings, the method introduces a parameter modification (voltage offset) to account for hysteresis effects, thereby improving image quality while maintaining a relatively simple adjustment procedure
Solution Approach 2:
The patent implements a feedback mechanism where the hysteresis behavior is measured and stored, and then used to compensate for future adjustments. The system records the relationship between excitation voltage and focusing position, and uses this feedback information to pre-correct subsequent adjustments, resolving the contradiction between simplicity and precision
2Manufacturing precision
If the objective lens excitation is changed to account for hysteresis, then image quality improves, but the adjustment procedure becomes more complex
Solution Approach 1:
The patent performs preliminary measurement of hysteresis effects during the adjustment process. By measuring and storing the hysteresis characteristics in advance, the system prepares compensation data that can be automatically applied in subsequent operations, improving precision without significantly increasing the complexity of routine adjustments
Solution Approach 2:
The system performs self-characterization by automatically measuring its own hysteresis behavior and using this information to compensate for it. The objective lens system essentially adjusts itself by utilizing its own measured characteristics, reducing the need for complex external calibration procedures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach leads to better image quality by accounting for the hysteresis of the objective lens, resulting in a more accurate adjustment of the particle beam relative to the objective lens, thereby improving the overall performance of the microscope.
Implementation Method 1
an objective lens (11) for focusing the particle beam (5) on an object (13)
Implementation Method 2
the hysteresis of the objective lens, which affects the magnetic field
Implementation Method 3
the hysteresis of the objective lens, which affects the magnetic field
Implementation Method 4
a beam adjustment device (25), which is arranged between the particle source (3) for producing the particle beam (5) and the objective lens (11) and which is set such that it steers or selects the particle beam (5)
Data Source
AI summary
A method of adjusting a particle beam microscope includes measures A, B, C and D.