Microscope Calibration for Accurate Pattern Illumination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing microscope-based systems face challenges in accurately illuminating varying patterns on samples across multiple fields of view due to mismatches between subsystems, leading to discrepancies in imaging and pattern illumination, which are exacerbated by mechatronics response and behavior.
Innovation Solution
An image-guided calibration method that measures differences between intended and actual illumination coordinates, generating correction factors to adjust the position of light projection, using a movable element to align patterns accurately across fields of view.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If pattern illumination is performed across multiple fields of view at high speed, then productivity is improved, but manufacturing precision deteriorates due to mismatches between subsystems and mechatronics response
Solution Approach 1:
The system performs calibration before actual illumination by projecting light at multiple coordinates and measuring differences between intended and actual positions. Correction factors are generated and stored in advance, then applied during high-speed illumination operations to maintain accuracy without sacrificing speed
Solution Approach 2:
The system measures the actual position of illuminated points and compares them with intended positions to generate correction factors. These feedback-based correction factors are then applied to adjust subsequent illumination positions, creating a closed-loop control system that maintains precision at high speeds
2Adaptability or versatility
If dynamic control is applied for varying illumination patterns, then adaptability is improved, but manufacturing precision deteriorates due to mechatronics response and behavior
Solution Approach 1:
The calibration process is performed beforehand to determine correction factors for different pattern types and positions. These pre-calculated correction factors are then applied during actual illumination operations, allowing the system to adapt to various patterns while maintaining precision through the pre-determined correction data
Solution Approach 2:
The system adjusts illumination parameters (position, angle, intensity) dynamically based on the desired pattern while applying correction factors that compensate for mechatronics response variations. This allows flexible pattern variation while maintaining accuracy through parameter compensation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures precise and consistent illumination of patterns on samples by correcting for displacement, speed, and acceleration errors, enhancing the accuracy and reliability of pattern illumination in microscope systems.
Implementation Method 1
a pattern illumination subsystem adapted to illuminate the regions of interest based on coordinates derived from the images by the processing subsystem, the method comprising: projecting light from the pattern illumination subsystem in an intended pattern according to a plurality of coordinates corresponding to locations on the sample
Implementation Method 2
an imaging subsystem adapted to obtain an image of a sample on the stage
Data Source
AI summary
A microscope based system for image-guided microscopic illumination is provided. The system may include a microscope, a stage, an imaging subsystem adapted to obtain an image of a sample on the stage, a processing subsystem adapted to identify regions of interest in the sample from images obtained by the imaging subsystem, and a pattern illumination subsystem adapted to illuminate the regions of interest based on coordinates derived from the images by the processing subsystem. Methods of calibrating the microscope based system may include projecting light from the pattern illumination subsystem in an intended pattern according to a plurality of coordinates corresponding to locations on the sample, measuring differences between coordinates of locations where the light strikes the sample and coordinates of the intended pattern, and generating correction factors based on the measured differences from the steady states and dynamic states.