Automated Microscope Slide Alignment Detection System

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Solution Overview

Problem

Inconsistent placement of microscope slides on automated treatment platforms leads to errors in reagent application and analysis, resulting in invalid or inconsistent results in microscopic analysis and imaging processes.

Innovation Solution

An automated method and system that measures the alignment between a microscope slide and a processing platform using image analysis to detect misalignment conditions, allowing for real-time correction and repositioning of the slide to ensure accurate placement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If automated substrate placement is used to increase productivity, then processing speed improves, but placement accuracy deteriorates leading to inconsistent results

Engineering Contradiction:
Improveprocessing speedVSAvoidplacement accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system performs preliminary alignment detection by capturing an image of the substrate position before processing begins. The image processing system analyzes the captured image to determine if the substrate is properly aligned with the platform, and only proceeds with processing if alignment criteria are met, preventing rework and ensuring consistent results.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system implements feedback control by continuously monitoring substrate placement through image capture and analysis. The alignment detection results provide feedback to the control system, which can adjust placement mechanisms or alert operators to correction needs, maintaining high precision throughout automated processing operations.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If manual substrate placement is used to improve placement accuracy, then alignment quality improves, but productivity deteriorates due to time-consuming manual operations

Engineering Contradiction:
Improvealignment qualityVSAvoidprocessing throughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system enables self-service automated placement by equipping the automated placement mechanism with integrated image capture and alignment detection capabilities. The system autonomously verifies substrate alignment immediately after placement, eliminating the need for manual inspection while maintaining high precision, thus achieving both automated throughput and quality control.

Inventive Principle:
Principle #25Self-service

3Reliability

If alignment detection is performed to ensure placement accuracy, then processing reliability improves, but system complexity increases due to additional imaging and analysis components

Engineering Contradiction:
Improveprocessing reliabilityVSAvoidsystem complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The system achieves multi-functionality by using the same imaging platform for both process monitoring and alignment detection. The image capture system serves dual purposes: documenting processing steps for quality records and analyzing substrate position for alignment verification. This eliminates the need for separate dedicated alignment sensors, reducing overall system complexity while maintaining high reliability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS12140745B2Method and system to detect substrate placement accuracy
Publication Date: 2024.11.12 VENTANA MEDICAL SYSTEMS INC
  • US12140745B2 patent drawing
  • US12140745B2 patent drawing
  • US12140745B2 patent drawing

AI summary

A method and system for measuring the alignment between a substrate and a platform upon which it is disposed by using image processing algorithms are described herein. These algorithms automate the detection of edges of a microscope slide and the platform in a digital image. A reference line pattern in an image of the platform can be used to detect platform edges based on a computed location of the reference line pattern in the image.