Channelized Microstrip Filter With Silicon Cavities for Cross-Coupling Control

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Solution Overview

Problem

High-frequency microstrip filters face challenges in achieving consistent performance due to sensitivity to housing variations, leading to undesired electromagnetic coupling and reproducibility issues, making pre-installation testing difficult and requiring tedious tuning or replacement.

Innovation Solution

A semiconductor-based channelized filter design with a dielectric substrate, metal traces, and a micro-machined silicon enclosure providing electromagnetic field isolation through conductive engagement and meandering elements to minimize cross-coupling, allowing for compact design and easy testing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional metal housing is used to enclose the microstrip filter, then electromagnetic isolation is provided, but variations in physical dimensions of the housing result in undesired variations in electromagnetic coupling and filter performance

Engineering Contradiction:
Improvefilter performance consistencyVSAvoidhousing dimension variations
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the material parameter from traditional metal housing to silicon enclosure, leveraging silicon's superior dimensional stability and manufacturability. The silicon enclosure is formed using semiconductor fabrication processes that provide tight dimensional control, eliminating the housing dimension variations that cause performance inconsistencies in traditional metal enclosures

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the mechanical machining process for housing fabrication with semiconductor fabrication processes. The silicon enclosure is formed through photolithography, etching, and deposition processes that provide repeatable dimensional accuracy, substituting the variable mechanical machining process with a precise semiconductor manufacturing process

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Area of stationary object

If individual internal elements of the filter are placed closer together to minimize area, then area occupation is reduced, but electromagnetic field interaction between elements increases

Engineering Contradiction:
Improvefilter area footprintVSAvoidelectromagnetic field interaction
Core Design Contradiction:
Area of stationary objectVSObject-affected harmful factors

Solution Approach 1:

The patent introduces silicon enclosure walls as intermediary structures between the microstrip filter elements. These walls act as electromagnetic barriers that prevent field interaction between closely spaced elements, allowing the filter to be miniaturized without suffering from increased electromagnetic coupling between adjacent elements

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The silicon enclosure divides the filter interior into separate segmented regions or channels, with each region containing individual filter elements. This segmentation isolates the electromagnetic fields of adjacent elements, preventing harmful interactions while enabling compact layout of the filter elements

Inventive Principle:
Principle #1Segmentation

3Ease of manufacture

If modular microstrip filter is designed for easy testing prior to installation, then assembly quality can be verified, but the housing sensitivity makes testing challenging

Engineering Contradiction:
Improvepre-installation testingVSAvoidhousing sensitivity to testing
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The silicon enclosure structure provides inherent electromagnetic isolation that creates a stable, controlled testing environment. The enclosure's precise dimensions and electromagnetic properties remain consistent during testing, allowing the filter to be characterized accurately before installation without the housing sensitivity issues that plague traditional metal enclosures

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves consistent and reproducible performance by minimizing electromagnetic coupling, enabling reliable pre-installation testing and compact filter design with reduced area footprint, improving manufacturing efficiency and filter performance.

Implementation Method 1

The cavities surround the respective other metal traces with the internal cavity walls engaging the additional traces adjacent the respective other metal traces to individually surround each of the other metal traces with a conductive metal thereby providing electromagnetic field isolation between each of the other metal traces

Methodology Applied
Scientific EffectElectromagnetic field isolation: Faraday Cage

Data Source

PatentUS11837561B2Channelized filter using semiconductor fabrication
Publication Date: 2023.12.05 NORTHROP GRUMMAN SYSTEMS CORP
  • US11837561B2 patent drawing
  • US11837561B2 patent drawing
  • US11837561B2 patent drawing

AI summary

A semiconductor technology implemented high-frequency channelized filter includes a dielectric substrate with metal traces disposed on one of two major surfaces of the substrate. An input and output port disposed on the substrate and one of the metal traces carrying a high-frequency signal to be filtered between the input and output port. Other of the metal traces are connected to the one metal trace at intervals along the length of the one metal trace each providing a reactance to the high-frequency signal where the reactance varies with frequency and additional traces of the metal traces serving as a reference ground for the one metal trace and the other metal traces. A silicon enclosure mounted to the substrate with a first planar surface with cavities in the enclosure that extend through the first surface, and internal walls within the silicon enclosure defining the cavities. A layer of conductive metal covers the first planar surface, cavities and the internal walls. The silicon enclosure having substantially continuous areas of metal on the first planar surface about the periphery of the silicon enclosure that engage corresponding areas of the additional traces about the periphery of the substrate. The cavities surround the respective other metal traces with the internal cavity walls engaging the additional traces adjacent the respective other metal traces to individually surround each of the other metal traces with a conductive metal thereby providing electromagnetic field isolation between each of the other metal traces.