Microstrip Resonator Layout for Uniform Plasma Density

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing plasma processing apparatuses face challenges in efficiently generating and maintaining uniform plasma density within the chamber, particularly due to limitations in the design of electromagnetic wave resonators.

Innovation Solution

The plasma processing apparatus incorporates a waveguide portion with a resonator that includes a microstrip and a dielectric member, where a part of the dielectric member constitutes a dielectric layer of the microstrip, allowing for efficient resonance of electromagnetic waves and uniform plasma generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If a conventional resonator design with metal reflective plates is used, then the resonator can resonate electromagnetic waves, but the resonator size becomes large and plasma density uniformity deteriorates

Engineering Contradiction:

Improveresonator sizeVSAvoidplasma density uniformity

Core Design Contradiction:

Volume of moving objectVSManufacturing precision

Solution Approach 1:

The patent changes the fundamental parameters of the resonator by replacing metal reflective plates with a dielectric member and microstrip structure. This parameter change allows the resonator to achieve the same electromagnetic wave resonance function with a significantly reduced size while improving plasma density uniformity through the different electromagnetic field distribution characteristics of the microstrip structure

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent substitutes the conventional metal-based resonator structure with a dielectric-microstrip based resonator structure. This substitution replaces the traditional mechanical/electrical resonance mechanism with a different physical mechanism that achieves better performance in terms of size and plasma uniformity

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If the resonator size is reduced, then the plasma density uniformity improves, but the resonance efficiency may deteriorate

Engineering Contradiction:

Improveplasma density uniformityVSAvoidresonance efficiency

Core Design Contradiction:

Manufacturing precisionVSPower

Solution Approach 1:

The patent optimizes parameters including the dielectric constant of the dielectric member, the width and length of the microstrip, and the spacing between components to achieve both compact size and high resonance efficiency. These parameter optimizations ensure that the reduced-size resonator maintains effective power coupling and resonance characteristics

Inventive Principle:

Principle #35Parameter changes

3Power

If a larger resonator is used, then the resonance efficiency is maintained, but the chamber space utilization deteriorates and plasma uniformity worsens

Engineering Contradiction:

Improveresonance efficiencyVSAvoidchamber space utilization

Core Design Contradiction:

PowerVSArea of stationary object

Solution Approach 1:

The patent employs parameter optimization of the microstrip dimensions, dielectric member properties, and resonator geometry to achieve high resonance efficiency in a compact configuration. This allows the resonator to maintain effective power coupling while occupying minimal chamber space

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent transitions from a two-dimensional metal plate structure to a three-dimensional microstrip-dielectric structure, utilizing vertical stacking and layered configuration to achieve compact size while maintaining resonance efficiency through optimized electromagnetic field distribution in multiple dimensions

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables the resonator to effectively resonate electromagnetic waves even with a smaller size, leading to improved uniformity of plasma density distribution within the chamber and efficient cleaning of deposits using radicals from a cleaning gas.

Implementation Method 1

The resonator is configured to resonate the electromagnetic waves therein

Methodology Applied

Scientific EffectResonance: Resonance

Implementation Method 2

The waveguide portion is configured to propagate electromagnetic waves to generate plasma within the chamber

Methodology Applied

Scientific EffectPlasma generation: Plasma

Implementation Method 3

The waveguide portion includes a resonator configured to resonate the electromagnetic waves therein. The resonator includes a microstrip and a dielectric member

Methodology Applied

Scientific EffectElectromagnetic wave propagation: Waveguide

Data Source

PatentUS20250104975A1Plasma processing apparatus

Publication Date: 2025.03.27 TOKYO ELECTRON LTD

AI summary

A plasma processing apparatus includes a chamber and a waveguide portion. The waveguide portion is configured to propagate electromagnetic waves to generate plasma within the chamber. The waveguide portion includes a resonator configured to resonate the electromagnetic waves therein. The resonator includes a microstrip and a dielectric member. A part of the dielectric member constitutes a dielectric layer of the microstrip.