Microstructure Patterns via Non-Contact Laser Patterning

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Solution Overview

Problem

Existing methods for creating microstructures on aerodynamic surfaces, such as those of vehicles, face challenges in reducing drag efficiently, including high costs and surface energy requirements for mask-based techniques and degradation issues with rolling contact processes.

Innovation Solution

A method and system utilizing proximity printing with a non-contacting mask and interference lithography to create microstructure patterns on exterior surfaces, allowing for high-resolution patterns without the need for multiple exposures and enabling the use of different photopolymer/developer combinations, which can be applied to complex surfaces and reduce skin friction drag.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If mask-based techniques are used to create microstructures on aerodynamic surfaces, then pattern precision can be achieved, but surface energy requirements and manufacturing costs increase significantly

Engineering Contradiction:
Improvepattern precisionVSAvoidmanufacturing cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent replaces traditional mechanical mask-based patterning systems with a direct laser writing system. The laser directly writes the microstructure pattern onto the coating layer without requiring physical masks, thereby eliminating mask manufacturing costs, surface energy requirements, and associated manufacturing complexities while maintaining high pattern precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention extracts and removes the mask component from the patterning system entirely. By using direct laser writing, the complex mask-based subsystem (including mask fabrication, surface preparation, and mask handling) is eliminated, leaving only the essential laser writing function that achieves the desired microstructure pattern

Inventive Principle:
Principle #2Taking out (Extraction)

2Area of stationary object

If rolling contact processes are used to apply microstructure patterns, then large surface areas can be covered, but the processes cause degradation to the coating or mask

Engineering Contradiction:
Improvesurface coverage areaVSAvoidcoating integrity
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent replaces mechanical rolling contact processes with a non-contact laser writing system. The laser beam writes the microstructure pattern without physically touching the coating surface, eliminating mechanical degradation while maintaining the ability to cover large surface areas through systematic scanning

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention introduces dynamic scanning capability to the laser writing system, allowing it to adapt to large and complex surface geometries. The laser beam can dynamically adjust its position and focus to cover extensive areas and accommodate surface curvature variations without physical contact

Inventive Principle:
Principle #15Dynamics

3Manufacturing precision

If traditional photolithography methods are used, then microstructure patterns can be formed, but multiple exposures are required increasing process time and complexity

Engineering Contradiction:
Improvemicrostructure pattern qualityVSAvoidprocess time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The invention extracts and removes the multiple exposure requirement from the photolithography process. The direct laser writing system writes the complete microstructure pattern in a single continuous process, eliminating the need for multiple exposure steps, alignment procedures, and associated time losses

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves reduced skin friction drag, leading to increased fuel efficiency and improved aerodynamics by creating microstructure patterns with precise control over curing depth profiles and pattern geometry, suitable for various vehicle surfaces.

Implementation Method 1

irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, wherein the radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentEP3362855B1Microstructure patterns
Publication Date: 2022.11.30 MICROTAU IP PTY LTD
  • EP3362855B1 patent drawingFigure 1
  • EP3362855B1 patent drawingFigure 2~3
  • EP3362855B1 patent drawingFigure 4~5

AI summary

In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity profile.