Microwave Thermal Processing with Electrophoretic Film Control
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Solution Overview
Problem
Existing thermal processing apparatuses using microwaves face challenges in controlling heat distribution on substrates due to changes in process conditions, substrate size, and chamber structure, requiring frequent redesign of antennas, which incurs unnecessary costs and inefficiencies.
Innovation Solution
A thermal processing apparatus with an electrophoretic film attached to the chamber walls, comprising cells with electrodes, absorption, and reflection plates, controlled by a controller to manage microwave paths and modes, allowing for optimal microwave distribution without redesigning the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If antenna design is changed to control heat distribution, then heat distribution control is improved, but device complexity and manufacturing costs increase due to frequent redesigns
Solution Approach 1:
The patent applies the dynamics principle by making the chamber wall properties changeable through electrophoretic film. The film can dynamically alter its electromagnetic characteristics (conductivity, permittivity) in response to different process conditions, substrate sizes, and chamber configurations. This dynamic adaptability allows the microwave heating system to maintain optimal heat distribution without requiring physical antenna redesigns, thus resolving the contradiction between heat distribution control and device complexity.
2Temperature
If antenna is redesigned for each process condition change, then heat distribution control is improved, but loss of time and productivity decrease due to frequent redesigns
Solution Approach 1:
The patent implements parameter changes by utilizing electrophoretic film that can alter its electromagnetic parameters (conductivity, permittivity) based on applied voltage. This allows the system to adapt to different process conditions, substrate sizes, and chamber configurations by changing the film's electrical properties rather than redesigning the antenna. The controller adjusts voltage to the electrophoretic film in real-time, enabling rapid adaptation without time-consuming physical redesigns.
3Device complexity
If fixed antenna design is used, then device complexity is reduced, but adaptability to different process conditions deteriorates
Solution Approach 1:
The patent introduces an intermediary element - the electrophoretic film - positioned between the microwave source and the substrate. This film acts as a mediator that can be controlled to adjust the electromagnetic field distribution within the chamber. By controlling the film's electrical properties through voltage application, the system achieves adaptability to different process conditions while maintaining a fixed, simple antenna design. The intermediary film bridges the gap between fixed hardware and variable process requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables controlled movement paths and modes of microwaves, maximizing microwave absorption on the substrate while minimizing losses, ensuring uniform emission and reducing unnecessary costs associated with frequent antenna redesigns.
Implementation Method 1
an electrophoretic film that switches as an absorber or reflector in an electrophoresis method on the inner wall of the chamber
Implementation Method 2
an electromagnetic wave absorption plate arranged bottomward and opposite to the upper substrate at a predetermined interval in a space between the first electrode and the second electrode
Implementation Method 3
an electromagnetic wave reflection plate arranged side by side with the absorption plate
Implementation Method 4
at least one or more charged particles enclosed in a cell space formed by the first electrode, the second electrode, the electromagnetic wave absorption plate, the electromagnetic wave reflection plate, and the upper substrate, and configured to move toward the first electrode or the second electrode according to a direction of an electric field formed inside the cell space
Implementation Method 5
a microwave unit positioned on an upper part of the thermal processing space and configured to form an electromagnetic field generated by the microwaves in the thermal processing space
Implementation Method 6
A substrate thermal processing method may be used for applying the heat energy to the substrate by using electromagnetic waves in a microwave band
Data Source
AI summary
A thermal processing apparatus using microwaves and a method of operating the same are proposed. Provided is the thermal processing apparatus and an operation method thereof capable of converting a mode of the microwaves emitted into a processing space without changing equipment design. The thermal processing apparatus using microwaves includes a chamber configured to form the thermal processing space for a substrate and have an inner wall to which an electrophoresis film attached, a substrate support unit positioned on a lower part of the thermal processing space and supporting the substrate, a microwave unit positioned on an upper part of the thermal processing space and forming an electromagnetic field generated by the microwaves in the thermal processing space, and a controller for controlling the electrophoretic film so as to control movement paths of the microwaves on the basis of a process condition and a size of the substrate.