Microwave Facility Frequency Adjustment for Impedance Matching
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Solution Overview
Problem
Traditional microwave treatment facilities face challenges in impedance matching and power distribution across multiple application devices, leading to non-uniform plasma generation and heating, and difficulty in monitoring resonance surfaces in ECR plasma excitation techniques.
Innovation Solution
A microwave treatment facility using solid-state generators with frequency adjustment systems and measurement systems to monitor and adjust the reflected and transmitted power, allowing for automated impedance matching and uniform power distribution, and monitoring of resonance surfaces by varying the frequency of the electromagnetic wave within the microwave range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If traditional microwave treatment facilities use fixed-frequency generators with multiple application devices, then power distribution can be simplified, but impedance matching becomes difficult and power reflected on application devices increases
Solution Approach 1:
The patent applies parameter changes by varying the frequency of the electromagnetic wave generated by the solid-state generator. The frequency is adjusted within a range (e.g., 2.4-2.5 GHz) to optimize impedance matching between the generator and application devices. This dynamic parameter adjustment allows the system to maintain reliable power transfer across multiple application devices without requiring complex individual impedance matching circuits for each device.
2Device complexity
If traditional facilities use manual impedance matching adjustment, then device complexity is reduced, but manufacturing precision and uniformity of plasma generation deteriorate
Solution Approach 1:
The patent implements feedback control by measuring the reflected power from application devices and using this information to automatically adjust the generator frequency. The control system continuously monitors the impedance matching condition and modifies the operating parameters to maintain optimal plasma generation uniformity across all application devices, eliminating the need for manual adjustment while achieving high precision.
3Ease of operation
If facilities use fixed frequency microwave generation, then ease of operation is improved, but the ability to monitor and adjust resonance surfaces in ECR plasma deteriorates
Solution Approach 1:
The patent applies dynamics by enabling the solid-state generator to dynamically adjust its operating frequency in response to real-time measurements of reflected power and plasma conditions. This dynamic capability allows the system to monitor resonance surfaces in ECR plasma by detecting frequency shifts that indicate changes in plasma density and composition, while maintaining ease of operation through automated control.
4Device complexity
If traditional power dividers are used to distribute power to multiple application devices, then device complexity is reduced, but power distribution uniformity and plasma uniformity deteriorate
Solution Approach 1:
The patent uses parameter changes by adjusting the frequency of the electromagnetic wave to optimize power distribution across multiple application devices. By varying the frequency within the microwave range, the system achieves more uniform power density distribution compared to traditional fixed-frequency power dividers, while maintaining a relatively simple overall architecture without requiring complex individual control for each device.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient impedance matching, uniform plasma generation, and optimized power distribution, improving the uniformity of heating and plasma density across treatment chambers, while allowing for real-time adjustments to maintain optimal operating conditions.
Implementation Method 1
at least one electromagnetic wave generator (4) in the microwave range, of the solid-state generator type, for producing an electromagnetic wave in the microwave range and adjusting its frequency
Implementation Method 2
a load (20) to be treated by the electromagnetic wave in the microwave range; this load (20) may comprise a liquid, solid or gaseous product having dielectric characteristics allowing it to absorb all or part of the wave
Implementation Method 3
a measurement system (31) for measuring the power reflected by the application device (30)
Implementation Method 4
A first application relates to facilities for microwave treatment by producing, in a treatment chamber, a plasma excited by a microwave radiation
Implementation Method 5
In the case of a microwave treatment facility using the production of an electron cyclotron resonance (ECR) plasma, a third application of the present invention is to make it possible to monitor the resonance surface in the vicinity of the or each application device
Data Source
AI summary
The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).