Microwave Graphene Production from Carbon-Rich Solids

The patent changes the chemical parameters by replacing strong acids (sulfuric acid, nitric acid) with weak acids (acetic acid, formic acid) and replacing strong oxidation agents (KMnO4, P2O5, K2S2O8) with milder oxidation agents (H2O2, NaClO, NaClO2). This parameter change eliminates the dangerous exothermic reactions and gas releases that cause reactor explosions, while still achieving effective graphene oxidation and exfoliation.

The patent extracts and removes the problematic strong acids from the synthesis process by using weak acids instead. This extraction of harmful substances eliminates the need for extensive water washing and centrifuge purification, as the weak acid byproducts can be easily removed or are environmentally benign, dramatically reducing water consumption and simplifying the purification workflow.

The patent utilizes phase transitions and rapid chemical reactions by employing microwave irradiation or ultrasonic assistance in combination with the improved chemical reagents. This enables the oxidation and exfoliation processes to complete in minutes rather than hours or days, dramatically reducing reaction time while maintaining or improving product quality through more uniform energy distribution and enhanced mass transfer.

The patent replaces the conventional mechanical and thermal processing methods with chemical-assisted approaches using weak acids and mild oxidation agents. This substitution eliminates the need for high-energy mechanical exfoliation and prolonged thermal treatment, significantly reducing energy consumption while reliably producing high-quality graphene layers and graphene oxides through more efficient chemical pathways.