Microwave Heating Layout for Uniform Substrate Zone Temperature
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Solution Overview
Problem
During substrate treatment using plasma, the intensity of the electromagnetic field in the chamber can become unstable due to standing waves, leading to uneven surface temperatures across the substrate zones.
Innovation Solution
A heating device that uses a plurality of electromagnetic waves with different power, frequency, or phase components to uniformly heat the substrate, accompanied by a temperature measurement module and control module to adjust heating based on zone temperature readings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single electromagnetic wave source is used for heating the substrate, then the device structure is simple, but the surface temperature uniformity across substrate zones deteriorates due to standing wave effects
Solution Approach 1:
The heating device is divided into multiple independent electromagnetic wave sources (first, second, and third electromagnetic waves) that can be controlled separately. Each wave source targets specific zones of the substrate, allowing independent temperature control for different regions to achieve uniform overall heating while avoiding standing wave effects that occur with single-source systems.
2Temperature
If multiple electromagnetic waves with different power, frequency, or phase are used to maintain uniform temperature, then temperature uniformity improves, but the device complexity and control difficulty increase
Solution Approach 1:
Different electromagnetic waves are applied to different zones of the substrate based on their specific heating requirements. The first electromagnetic wave heats the entire substrate, the second wave targets the center zone, and the third wave targets the edge zone. This localized approach allows each wave to be optimized for its specific region, achieving uniform temperature distribution without requiring overly complex device architecture.
Solution Approach 2:
The heating device employs dynamic control of multiple electromagnetic waves with adjustable power, frequency, and phase parameters. The control module continuously monitors substrate temperature and dynamically adjusts the characteristics of each electromagnetic wave in real-time, allowing the system to adapt to changing conditions and maintain uniform temperature despite the increased complexity of multiple wave sources.
3Temperature
If electromagnetic waves are applied during the entire substrate treatment process, then heating effectiveness improves, but the treatment time increases
Solution Approach 1:
The heating device applies electromagnetic waves in periodic cycles rather than continuously throughout the entire treatment process. The control module activates different electromagnetic wave combinations at different stages: initial heating phase, intermediate adjustment phase, and final stabilization phase. This periodic application maintains effective heating while reducing total treatment time compared to continuous heating.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively maintains uniform surface temperatures across all substrate zones, reducing processing time and improving the consistency of substrate treatment.
Implementation Method 1
a plurality of microwave generating modules generating a plurality of microwaves
Implementation Method 2
the plurality of microwaves are different from each other in at least one component of power, frequency or phase
Implementation Method 3
a temperature measurement module including a plurality of temperature sensors and measuring a surface temperature of each zone of the substrate
Data Source
AI summary
A heating device capable of uniformly maintaining a surface temperature of each zone of a substrate and a substrate treating apparatus including the same are provided. The substrate treating apparatus comprises a chamber housing providing a space in which a substrate is treated; a substrate support unit supporting the substrate inside the chamber housing; a showerhead unit providing a process gas into the chamber housing; a plasma generating unit generating plasma for treating the substrate inside the chamber housing by using the process gas; and a heating device heating the substrate by using a plurality of electromagnetic waves, wherein the plurality of electromagnetic waves are different from each other in at least one component of power, frequency or phase.