Microwave Chamber Lid Layout for Remote Plasma Cleaning
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Solution Overview
Problem
In plasma processing apparatuses using microwaves for film formation, the arrangement of a radiation part on the upper portion of the processing container prevents the placement of a remote plasma unit, making it difficult to perform effective cleaning by remote plasma.
Innovation Solution
A plasma processing apparatus with a lid member that includes through-holes for microwave radiation, a protruded portion with a flow path and gas holes, and a supply port connected to a remote plasma unit, allowing for the efficient supply of plasmarized cleaning gas into the processing container.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the radiation part is arranged on the upper portion of the processing container, then plasma generation stability is improved, but the remote plasma unit cannot be placed and cleaning effectiveness deteriorates
Solution Approach 1:
The lid member is segmented into functionally distinct regions: a central region with through-holes for microwave radiation and plasma generation, and a peripheral protruded portion with flow paths and gas holes for cleaning gas supply. This segmentation allows the radiation part and remote plasma unit to coexist without spatial conflict, maintaining both plasma generation stability and cleaning effectiveness
Solution Approach 2:
The cleaning function is transitioned from a vertical arrangement (remote plasma unit above the chamber) to a horizontal integration within the lid member structure. The protruded portion extends radially outward to accommodate the remote plasma unit and flow paths, effectively utilizing the lateral dimension to resolve the spatial conflict with the central radiation part
2Ease of operation
If the remote plasma unit is placed outside the processing container, then cleaning gas can be supplied, but the flow path becomes long causing gas deactivation
Solution Approach 1:
The protruded portion acts as an intermediary structure that bridges the remote plasma unit (located outside the processing container) and the interior chamber. It provides a dedicated flow path that shortcuts the gas delivery route, supplying plasmarized cleaning gas directly to the chamber through multiple gas holes while minimizing exposure time and preventing deactivation
Solution Approach 2:
The cleaning gas is plasmarized in advance in the remote plasma unit before entering the processing container. The protruded portion is designed to deliver this pre-activated gas quickly to the chamber through optimized flow paths and multiple discharge holes, ensuring the gas remains activated throughout the delivery process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables effective cleaning with remote plasma even when the radiation part is on the upper portion of the processing container, while maintaining the stability of plasma generation and reducing the deactivation of the plasmarized cleaning gas.
Implementation Method 1
a radiation part for radiating microwaves is arranged
Implementation Method 2
a remote plasma unit connected to the supply port and configured to plasmarize a cleaning gas and supply the plasmarized cleaning gas to the supply port
Data Source
AI summary
A plasma processing apparatus includes: a processing container in which a stage is accommodated and including an opening formed above the stage; a lid member for sealing the opening and including: at least one through-hole formed in a region facing the stage and in which a radiation part for radiating microwaves is arranged; a protruded portion formed on a first surface facing an interior of the processing container to protrude toward the interior of the processing container along an edge of the opening; a flow path formed inside the protruded portion; gas holes formed on the first surface to communicate with the flow path; and a supply port formed on a second surface facing an exterior of the processing container to communicate with the flow path; and a remote plasma unit connected to the supply port and for plasmarizing a cleaning gas and supply the same to the supply port.