Microwave Waveguide Phase Control for Uniform Batch Plasma Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing batch-type substrate processing apparatuses with inductively coupled plasma sources face challenges in achieving uniform electric field strength and efficient power absorption in plasma generation, leading to non-uniform processing results and reduced productivity.
Innovation Solution
A semiconductor manufacturing apparatus with a microwave introducing unit featuring a rectangular waveguide and phase controller, which generates a surface wave plasma by controlling the phase of microwaves, ensuring uniform electric field distribution and improved power absorption efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an inductively coupled plasma source is used in a batch-type substrate processing apparatus, then processing capability is provided, but uniform electric field strength distribution and efficient radical species delivery cannot be achieved
Solution Approach 1:
The patent replaces the inductively coupled plasma source with a microwave-based plasma generation system. Specifically, it uses a rectangular waveguide with slots to introduce microwaves into the processing chamber, generating plasma through microwave-electron interaction rather than inductive coupling. This substitution enables superior electric field uniformity and radical species delivery efficiency, directly resolving the technical contradiction between manufacturing precision and productivity.
Solution Approach 2:
The patent changes the fundamental operating parameters of the plasma generation system by transitioning from inductive coupling to microwave excitation. The microwave frequency (typically 2.45 GHz) and the slot geometry in the rectangular waveguide are optimized to achieve uniform electric field distribution across the substrate surface. This parameter change enables simultaneous achievement of high uniformity and processing efficiency.
2Quantity of substance
If conventional plasma sources are used, then processing can be performed, but radical species delivery efficiency is insufficient
Solution Approach 1:
The patent replaces conventional inductive plasma sources with a microwave-based system that generates higher density radical species. The microwave energy directly couples with electrons to produce a more efficient plasma chemistry environment, increasing the quantity of reactive radical species available for processing. This substitution simultaneously improves both radical delivery efficiency and overall processing productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves enhanced uniformity of electric field strength and improved productivity by generating a surface wave plasma with controlled phase shifts, reducing exudation and enhancing reactive species supply.
Implementation Method 1
a microwave introducing unit that generates a plasma from the processing gas by introducing microwaves
Implementation Method 2
generates a plasma from the processing gas
Implementation Method 3
a phase controller that is provided at a terminating end of the rectangular waveguide and controls a phase of the microwaves propagating in the rectangular waveguide
Data Source
AI summary
A semiconductor manufacturing apparatus includes: a processing container that accommodates a substrate holder that holds a plurality of substrates in a shelf shape; a gas supply that supplies a processing gas into the processing container; and a microwave introducer that generates a plasma from the processing gas. The microwave introducer includes: a rectangular waveguide provided along a length direction of the processing container and including a plurality of slots that radiates microwaves; and a phase controller that is provided at an end of the rectangular waveguide and controls a phase of the microwaves propagating in the rectangular waveguide.