Microwave Plasma Distributor with Dynamic Partition Control
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Solution Overview
Problem
Existing microwave plasma processing apparatuses face challenges in maintaining uniform plasma distribution within the processing space, leading to non-uniform processing of substrates due to a fixed microwave distribution ratio.
Innovation Solution
A microwave plasma processing apparatus that includes a distributor to dynamically adjust the microwave distribution ratio based on monitored voltage differences, using a control unit to acquire and apply control values from a storage unit, and incorporates phase shifters to optimize phase alignment, ensuring uniform plasma distribution across the processing space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a fixed distribution ratio is used in the distributor, then the device complexity is reduced, but the plasma distribution uniformity deteriorates
Solution Approach 1:
The patent applies the dynamics principle by making the distributor adjustable rather than fixed. The distributor includes a movable partition wall that can be positioned at different locations to dynamically change the distribution ratio of microwaves to multiple waveguides. This allows the system to adapt to different processing requirements and maintain uniform plasma distribution across the substrate surface by optimizing microwave power distribution.
Solution Approach 2:
The patent implements parameter changes by allowing the distribution ratio of microwaves to be varied. By changing the position of the movable partition wall in the distributor, the power distribution ratio among multiple waveguides is adjusted. This parameter adjustment enables optimization of plasma uniformity for different substrate sizes and processing conditions without increasing fundamental system complexity.
2Manufacturing precision
If the microwave distribution ratio is dynamically adjusted, then the plasma distribution uniformity is improved, but the device complexity increases
Solution Approach 1:
The distributor is designed with a movable partition wall that can be adjusted to different positions, creating a dynamic structure. This single movable component enables flexible control of microwave distribution ratios without requiring complex electronic control systems or multiple fixed distributors, thus achieving dynamic adaptability with minimal increase in device complexity.
Solution Approach 2:
The system changes the physical parameter of the distributor (partition wall position) to achieve different distribution ratios. This mechanical parameter adjustment is simpler than electronic control methods and directly affects the microwave power distribution, providing an intuitive and effective way to optimize plasma uniformity.
3Manufacturing precision
If phase shifters are added to optimize phase alignment, then the plasma distribution uniformity is improved, but the device complexity and cost increase
Solution Approach 1:
The patent incorporates a feedback mechanism where the state of plasma or microwave distribution is monitored, and based on this information, the movable partition wall in the distributor is adjusted to optimize the distribution ratio. This feedback control allows the system to automatically compensate for non-uniformities and maintain optimal plasma distribution without requiring complex phase shifters or sophisticated control algorithms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves and maintains uniform plasma distribution, enhancing the consistency of substrate processing by dynamically adjusting the microwave distribution ratio and phase alignment, thereby improving processing quality.
Implementation Method 1
a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space
Implementation Method 2
a waveguide configured to guide the microwave generated by the microwave generator into the processing container
Implementation Method 3
the microwaves are radiated into the processing container from the slot antenna and the processing gas in the processing container is deionized to excite the plasma
Data Source
AI summary
Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space; a microwave generator configured to generate microwaves; a distributor configured to distribute the microwaves to a plurality of waveguides; an antenna installed in the processing container and to radiate the microwaves distributed to the plurality of waveguides to the processing space; a monitor unit configured to monitor a voltage of each of the plurality of waveguides; a storage unit configured to store a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the distributor corresponding to the difference; and a control unit configured to acquire the control value of the distribution ratio of the distributor from the storage unit and to control the distribution ratio of the distributor.