Microwave Plasma Source Annular Dielectric Slow-Wave Members
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Solution Overview
Problem
Conventional plasma processing apparatuses face challenges in achieving uniform plasma distribution across large semiconductor wafers, requiring multiple microwave radiation mechanisms and complex adjustments to maintain plasma uniformity and intensity.
Innovation Solution
A microwave plasma source with a metal main body, annular dielectric slow-wave members, and a slot antenna part, where the slow-wave members are arranged to extend on both sides of microwave introduction mechanisms, allowing for uniform plasma distribution in the circumferential direction with fewer radiation members, and an annular dielectric microwave transmission member to guide microwaves effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple microwave radiation mechanisms are installed to achieve uniform plasma distribution, then plasma uniformity is improved, but device complexity and cost increase
Solution Approach 1:
The invention divides the annular microwave radiation structure into multiple discrete dielectric members arranged circumferentially. Each dielectric member acts as an independent radiation unit, allowing the system to achieve uniform plasma distribution through segmented radiation sources rather than a single complex radiation mechanism.
Solution Approach 2:
The invention combines multiple dielectric members with microwave introduction mechanisms into an integrated annular radiation structure. The dielectric members are arranged circumferentially and work together as a unified system to generate uniform plasma distribution, merging the functions of multiple components into a coordinated whole.
2Manufacturing precision
If multiple microwave introduction mechanisms are arranged circumferentially, then plasma uniformity is improved, but adjustment complexity increases
Solution Approach 1:
The invention designs each dielectric member with integrated microwave introduction mechanisms that perform multiple functions: impedance matching, phase control, and radiation directionality. This multi-functionality reduces the need for separate adjustment mechanisms for each component, simplifying overall system operation.
Solution Approach 2:
The invention controls plasma distribution uniformity by adjusting parameters such as the circumferential spacing of dielectric members, their radial positions, and microwave introduction phases. By optimizing these parameters, the system achieves uniform plasma distribution without requiring complex real-time adjustments during operation.
3Device complexity
If fewer microwave radiation members are used, then device complexity is reduced, but plasma uniformity deteriorates
Solution Approach 1:
The invention transitions from linear or discrete radiation arrangements to an annular circumferential configuration. By distributing dielectric members around the chamber perimeter in a circular pattern, the system achieves uniform plasma distribution with fewer total members compared to linear arrays, as the circular geometry naturally provides omnidirectional coverage.
Solution Approach 2:
The dielectric members act as intermediary elements that convert microwave energy from the introduction mechanisms into directed radiation patterns. Each dielectric member serves as a mediator that shapes and directs microwave energy, enabling efficient plasma generation with reduced member count while maintaining uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables uniform plasma distribution across the wafer surface, reducing the number of microwave radiation members needed and enhancing plasma processing efficiency, while minimizing mode jumping and microwave interference, thus improving processing stability and cost-effectiveness.
Implementation Method 1
a plurality of dielectric slow-wave members which is arranged in an overall annular shape in the vicinity of an arrangement surface of the main body on which the microwave introduction mechanisms are arranged
Implementation Method 2
a slot antenna part installed between the slow-wave members and the microwave transmission member and has a plurality of microwave radiation slots formed in an overall circumferential shape
Implementation Method 3
a microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber
Data Source
AI summary
A microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber of a plasma processing apparatus, which includes: a microwave output part for outputting the microwave; a microwave transmission part for transmitting the microwave; and a microwave radiation member for radiating the microwave into the chamber. The microwave transmission part includes a plurality of microwave introduction mechanisms circumferentially arranged in a peripheral portion of the microwave radiation member and configured to introduce the microwave into the microwave radiation member. The microwave radiation member includes a metal main body, a plurality of dielectric slow-wave members arranged in an overall annular shape in the vicinity of an arrangement surface of the main body, an annular dielectric microwave transmission member arranged in a microwave radiation surface of the main body, and a slot antenna part installed between the slow-wave members and the microwave transmission member.