Microwave Port Layout for Uniform Plasma Processing

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Solution Overview

Problem

Existing plasma processing apparatuses experience interference between electromagnetic waves emitted from multiple ports, leading to inefficiencies and potential damage due to reflected power, which affects the uniformity and utilization of microwave power.

Innovation Solution

The apparatus is designed with a dielectric top plate and conductor plate configuration that includes four electromagnetic wave emitting ports arranged in a specific non-overlapping manner, with perpendicular long sides and a rectangular parallelepiped shape, along with a controlled phase shifter system to synchronize microwave phases, preventing interference and enhancing power utilization.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple electromagnetic wave emitting ports are used to improve plasma processing efficiency, then productivity is improved, but electromagnetic wave interference occurs between ports

Engineering Contradiction:
Improveplasma processing efficiencyVSAvoidelectromagnetic wave interference
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent applies asymmetry by arranging the four electromagnetic wave emitting ports such that their long sides are parallel to the closest side of the dielectric top plate, and the long sides of ports with the same orientation do not overlap. This asymmetric spatial arrangement prevents electromagnetic wave interference while maintaining high plasma processing efficiency through multiple port operation.

Inventive Principle:
Principle #4Asymmetry

2Use of energy by moving object

If electromagnetic wave emitting ports are arranged to maximize power utilization, then use of energy is improved, but interference between ports increases

Engineering Contradiction:
Improvemicrowave power utilizationVSAvoidreflected power interference
Core Design Contradiction:
Use of energy by moving objectVSObject-generated harmful factors

Solution Approach 1:

The asymmetric arrangement of emitting ports with non-overlapping long sides in the same direction optimizes microwave power utilization by preventing interference patterns that would cause reflected power, thereby maximizing energy transfer to the plasma while avoiding harmful electromagnetic interactions between ports.

Inventive Principle:
Principle #4Asymmetry

3Manufacturing precision

If four electromagnetic wave emitting ports are arranged with long sides parallel to dielectric top plate sides, then manufacturing precision is improved, but electromagnetic wave interference may occur

Engineering Contradiction:
Improveport arrangement precisionVSAvoidelectromagnetic wave interference
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent resolves the contradiction between precise manufacturing (parallel arrangement) and interference prevention by introducing an asymmetric constraint: while long sides are parallel to the dielectric top plate sides for manufacturing precision, the long sides of ports with the same orientation are positioned to not overlap, thereby eliminating electromagnetic wave interference through asymmetric spatial distribution.

Inventive Principle:
Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration achieves uniform plasma distribution and high-density radical generation, improving film formation quality by minimizing interference and optimizing microwave power efficiency.

Implementation Method 1

a conductor plate which supports the dielectric top plate and has electromagnetic wave emitting ports for emitting electromagnetic waves to the dielectric top plate

Methodology Applied
Scientific EffectElectromagnetic wave emission: Electromagnetic Induction

Implementation Method 2

controlling phases of the plurality of electromagnetic waves emitted from the plurality of electromagnetic wave emission means, the step of emitting a plurality of phase-controlled electromagnetic waves

Methodology Applied
Scientific EffectPhase control: Phase Modulation

Implementation Method 3

processing the substrate with localized plasma generated between the dielectric window and the stage

Methodology Applied
Scientific EffectPlasma generation: Plasma

Data Source

PatentUS12444574B2Plasma processing apparatus, and plasma processing method
Publication Date: 2025.10.14 TOKYO ELECTRON LTD
  • US12444574B2 patent drawing
  • US12444574B2 patent drawing
  • US12444574B2 patent drawing

AI summary

There is provided a plasma processing apparatus comprising: a processing container configured such that a substrate is subjected to plasma processing; a dielectric top plate which is quadrangular and which is provided to close an upper opening of the processing container; and a conductor plate supporting the dielectric top plate and having four electromagnetic wave emitting ports for emitting electromagnetic waves to the dielectric top plate. Each of the four electromagnetic wave emitting ports has a rectangular shape having long side and short side, the electromagnetic wave emitting ports are arranged such that the long side of each of the four electromagnetic wave emitting ports are parallel to the closest side among four sides of the dielectric top plate forming the quadrangular shape, and the long sides of the two electromagnetic wave emitting ports oriented in a same direction do not overlap each other in the same direction.