Microwave Source Impedance Matching via Temporal Switching
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Solution Overview
Problem
In microwave processing apparatuses for semiconductor wafers, accurately matching impedance between multiple microwave sources and the processing chamber is challenging, especially when multiple microwaves are introduced simultaneously, leading to reduced accuracy in reflection wave detection and impedance matching.
Innovation Solution
A control method and apparatus that switches between a state where multiple microwaves are introduced simultaneously and a state where a single microwave source is used for impedance matching, allowing for accurate detection of reflection waves and individual impedance matching between microwave sources and the processing chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If multiple microwaves are introduced simultaneously into the processing chamber, then the processing capability for large semiconductor wafers is improved, but the accuracy of reflection wave detection and impedance matching deteriorates
Solution Approach 1:
The patent divides the microwave introduction process into separate time slots for each microwave source. Instead of introducing all microwaves simultaneously, each microwave source introduces its microwave sequentially, allowing the reflection wave from each source to be detected independently without interference from other sources. This segmentation resolves the contradiction by maintaining multiple microwave sources for processing capability while enabling accurate reflection wave detection through temporal separation.
2Productivity
If multiple microwaves are introduced simultaneously into the processing chamber, then the processing efficiency is improved, but the accuracy of impedance matching deteriorates
Solution Approach 1:
The patent implements periodic action by introducing microwaves from multiple sources in alternating time slots rather than simultaneously. Each microwave source operates periodically, introducing its microwave and allowing reflection wave detection in sequence. This periodic operation maintains high processing efficiency by utilizing all microwave sources while achieving accurate impedance matching through the periodic temporal separation of microwave introductions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves the accuracy of impedance matching between microwave sources and the processing chamber, enabling more precise control and efficient processing of semiconductor wafers by allowing for accurate detection of reflection waves and individual impedance adjustments.
Implementation Method 1
a magnetron is generally used as a microwave source for generating a microwave
Implementation Method 2
an apparatus using a microwave instead of a lamp or a heater is known as the apparatus for performing heat treatment on the semiconductor wafer
Data Source
AI summary
A microwave processing apparatus includes: a processing chamber; a microwave introducing unit for generating microwaves and introducing the microwaves into the chamber; and a control unit for controlling the microwave introducing unit. The microwave introducing unit has microwave sources for generating the microwaves and transmission lines for transmitting the microwaves into the chamber and introduces parts of the microwaves into the chamber simultaneously, and the control unit switches a first state of introducing said parts of the microwaves into the chamber to a second state of generating a microwave by one of the microwave sources and introducing into the chamber.