Mirror-Symmetric Deflection Units for Compact Parallel Laser Scanning
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Solution Overview
Problem
Additive manufacturing systems face challenges in compact design and efficiency due to the large size of galvanometer motors and the space requirements for multiple scanning mirrors, which hinder the simultaneous processing of components by multiple laser devices.
Innovation Solution
A modular deflection system with mirror-symmetrically arranged scanning units, allowing for a compact configuration by minimizing the distance between movable mirrors and maintaining independent operation, enabling simultaneous laser processing across overlapping working fields without increasing the scan radius.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple scanning mirrors and galvanometer motors are used for parallel laser processing, then productivity is improved, but device complexity and space requirements increase
Solution Approach 1:
The patent combines multiple scanning functions into a single galvanometer motor by using multiple movable mirrors (first and second movable mirrors) that are both driven by the same motor. This allows parallel laser processing with multiple working beams while reducing the number of motors and overall system complexity.
Solution Approach 2:
The patent segments the scanning function across multiple movable mirrors (first movable mirror for first working beam, second movable mirror for second working beam) that share a common drive mechanism. This segmentation allows independent control of multiple beams while using a single motor, resolving the contradiction between parallel processing capability and device complexity.
2Volume of moving object
If the distance between movable mirrors is reduced for compact design, then volume is improved, but manufacturing precision may worsen
Solution Approach 1:
The patent arranges the first and second movable mirrors in a mirror-symmetric configuration around a central axis, allowing compact spacing in the radial direction while maintaining precise optical paths. The mirrors are positioned at different angular positions rather than being simply stacked, which enables compact design without compromising precision.
Solution Approach 2:
The patent uses mirror-symmetric arrangement where the first and second movable mirrors are positioned asymmetrically relative to each other around the central axis, with each mirror optimized for its specific working beam path. This asymmetric positioning within a symmetric overall structure allows compact design while maintaining the required manufacturing precision for each individual beam.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves a compact and efficient design for parallelized laser processing, enhancing productivity while reducing the overall size and maintaining high accuracy, and allows for reduced inert gas usage and cost, along with improved maintenance flexibility.
Implementation Method 1
Each deflection unit comprises a scanning device configured for scanning a respective working beam over a corresponding working field
Implementation Method 2
The mirrors are typically attached to a permanent magnet that is configured to inductively interact with a coil wound within the corresponding galvanometer motor when an electric current flows through the coil
Data Source
AI summary
The invention refers to a deflection module comprising a first deflection unit (10a) comprising a first scanning device (12a) for scanning a first working beam (50a) over a first working field and (40a) and a second deflection unit (10b) comprising a second scanning device (12b) for scanning a second working beam (50b) over a second working field (40b). At least a movable mirror (12a-2) of the first scanning device (12a) and at least a movable mirror (12b-2) of the second scanning device (12b) are arranged mirror-symmetrically with respect to each other. The first working field (40a) and the second working field (40b) overlap in a common overlap area (42).