EUV Lithography Mirror Tilt Angle Measurement Integration
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Solution Overview
Problem
Current EUV lithography installations face challenges in quickly and accurately measuring the tilt angle of mirrors, which limits the speed of regulation and affects the quality of mask patterns imaged on substrates, and requires complex control loops and voltage supply management.
Innovation Solution
An apparatus and method that integrate an image acquisition device and comparator device within the same integrated circuit to rapidly determine the tilt angle of mirrors, allowing for aliasing-free measurements above the resonant frequency, enabling external control loops and simplifying actuation and voltage supply management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If separate control loops and voltage supply management are used for each mirror, then individual mirror control is achieved, but device complexity and maintenance difficulty increase
Solution Approach 1:
The patent integrates the image acquisition device and comparator device into a single integrated circuit, merging multiple functions (pattern acquisition, comparison, and tilt angle determination) into one unified component. This reduces the number of separate control loops needed and simplifies the overall system architecture while maintaining individual mirror control capability.
Solution Approach 2:
The integrated circuit serves multiple functions simultaneously: it acts as both the image acquisition device and the comparator device, and can determine tilt angles for multiple mirrors. This multi-functionality reduces the need for separate dedicated components for each mirror, thereby reducing device complexity.
2Reliability
If traditional separate control loops are used for each mirror, then individual mirror monitoring is achieved, but the system requires complex voltage supply management
Solution Approach 1:
By combining the image acquisition device and comparator device into one integrated circuit, the patent reduces the number of separate voltage supply lines and control signals needed. The integrated circuit can be supplied with a single voltage, eliminating the need for complex voltage management across multiple separate components.
3Device complexity
If slow tilt angle measurement is used, then system complexity is reduced, but regulation speed and mask pattern quality deteriorate
Solution Approach 1:
The integrated circuit performs the comparison of the acquired pattern with the reference pattern immediately upon acquisition, without requiring external processing. This preliminary action within the integrated circuit enables faster tilt angle determination and regulation, improving productivity without significantly increasing overall system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables fast and accurate tilt angle measurement, improving the quality of mask patterns, increasing throughput, and simplifying the setup and maintenance of EUV lithography installations by allowing digital regulation and reducing the need for local control loops.
Implementation Method 1
an image acquisition device for acquiring the generated pattern which was reflected by the mirror
Data Source
AI summary
An apparatus for establishing a tilt angle of at least one mirror of a lithography installation is disclosed. The apparatus includes a pattern generating device (6) for generating a pattern. The apparatus also includes an image acquisition device for acquiring the generated pattern which was reflected by the mirror. The apparatus further includes a comparator device for providing a comparison result in a manner dependent on a comparison of the acquired pattern with a reference pattern. In addition, the apparatus includes an evaluation device for establishing the tilt angle in a manner dependent on the comparison result. The image acquisition device and the comparator device are provided in the same integrated circuit.