Misregistration Metrology Calibration Across Multiple Wafer Tools
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Solution Overview
Problem
Current methods for measuring misregistration in semiconductor device manufacturing are inefficient in calibrating multiple tools, leading to inaccuracies and inconsistencies in misregistration data across different metrology tools.
Innovation Solution
A multiple-tool parameter set calibration method using a calibrated set of measurement parameters generator (CSMPG) that processes data from reference and initially-uncalibrated metrology tools, employing machine-learning algorithms to generate calibrated parameters for accurate misregistration measurement between semiconductor device layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple misregistration metrology tools are used to measure misregistration, then measurement throughput is improved, but measurement precision deteriorates due to tool-to-tool inconsistencies
Solution Approach 1:
The system changes the measurement parameters by introducing a reference metrology tool with known accurate parameters to calibrate the parameters of production metrology tools. The CSMPG algorithm adjusts and calibrates the measurement parameters of multiple tools based on reference measurements, enabling consistent and accurate misregistration measurements across all tools while maintaining high throughput.
2Device complexity
If traditional calibration methods are used for multiple tools, then device complexity is reduced, but manufacturing precision deteriorates due to calibration inaccuracies
Solution Approach 1:
The system introduces a reference misregistration metrology tool as an intermediary with known accurate measurement capabilities. This reference tool serves as a mediator to calibrate multiple production metrology tools, enabling accurate tool-to-tool matching without requiring complex inter-tool calibration procedures. The CSMPG algorithm processes measurements from the reference tool to generate calibrated parameter sets for production tools.
3Ease of operation
If no calibration is performed on production metrology tools, then ease of operation is improved, but measurement precision deteriorates due to tool-induced shifts
Solution Approach 1:
The system performs preliminary calibration of production metrology tools using the reference tool before actual misregistration measurements are taken. The CSMPG algorithm generates calibrated parameter sets in advance based on reference measurements, which are then applied to production tools. This preliminary calibration action ensures high measurement precision while keeping the actual measurement operation simple and straightforward.
Data Source
AI summary
A multiple-tool parameter set calibration and misregistration measurement method useful in the manufacture of semiconductor devices including using at least a first reference misregistration metrology tool using a first set of measurement parameters to measure misregistration between at least two layers on a wafer of a batch of wafers, thereby generating a first misregistration data set, transmitting the first set of parameters and the data set to a calibrated set of measurement parameters generator (CSMPG) which processes the first set of parameters and the data set thereby generating a calibrated set of measurement parameters which are transmitted from the CSMPG to calibrate at least one initially-uncalibrated misregistration metrology tool based on the calibrated set of measurement parameters. Thereafter, misregistration is measured between at least two layers of at least one wafer, using at least the initially-uncalibrated misregistration metrology tool using the calibrated set of measurement parameters for the measuring.