Mist Guard Cleaning Coverage in Substrate Processing Chambers
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Solution Overview
Problem
Current substrate processing systems face challenges in effectively cleaning the mist guard, which can lead to mist adherence and contamination within the processing chamber, affecting the cleanliness and productivity of the substrate processing process.
Innovation Solution
A substrate processing apparatus is designed with a holder, driving unit, inner cup body, mist guard, processing liquid supply, and cleaning liquid supply, where the controller manages the rotation of the substrate and mist guard to disperse cleaning liquid over the entire inner peripheral surface of the mist guard, ensuring thorough cleaning and preventing mist adherence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If cleaning liquid is supplied to the mist guard using conventional methods, then some cleaning effect is achieved, but the cleaning is insufficient and mist adherence occurs
Solution Approach 1:
The cleaning liquid supply system is segmented into multiple nozzles positioned at different locations (upper, lower, and side nozzles) to comprehensively cover the entire inner peripheral surface of the mist guard. This segmentation allows cleaning liquid to reach all areas including hard-to-reach regions, ensuring thorough cleaning and preventing mist adherence.
Solution Approach 2:
A diffusing member is introduced as an intermediary component between the cleaning liquid supply and the mist guard. This diffusing member disperses the cleaning liquid into fine droplets that can evenly coat and penetrate the entire inner peripheral surface of the mist guard, significantly improving cleaning effectiveness compared to direct liquid application.
2Reliability
If the mist guard is cleaned thoroughly using multiple cleaning liquids and diffusing members, then cleaning effectiveness is improved, but the device complexity increases
Solution Approach 1:
The cleaning liquid supply unit is designed with multi-functionality, incorporating multiple types of nozzles (upper, lower, and side nozzles) and a diffusing member that can work with different cleaning liquids. This universal design allows a single integrated unit to perform comprehensive cleaning of the entire mist guard surface, achieving thorough cleaning without requiring multiple separate cleaning systems.
3Area of stationary object
If cleaning liquid is dispersed to the entire inner peripheral surface including hard-to-reach areas, then cleaning coverage is improved, but the time and complexity of the cleaning process increases
Solution Approach 1:
The cleaning process employs periodic action by sequentially operating different nozzle groups and the diffusing member. The controller activates upper nozzles, then lower nozzles, then side nozzles, and finally the diffusing member in sequence. This periodic operation ensures comprehensive coverage of the entire inner peripheral surface while maintaining efficient cleaning time through automated sequential execution.
Solution Approach 2:
The cleaning system is designed to be self-service through automated control. The controller automatically sequences the operation of multiple nozzles and the diffusing member, and the system self-regulates the cleaning process without requiring manual intervention. This automation achieves complete cleaning coverage while minimizing cleaning time and operational complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables effective cleaning of the mist guard, enhancing productivity by ensuring the entire surface is cleaned quickly and thoroughly, reducing the risk of contamination and improving the overall substrate processing efficiency.
Implementation Method 1
supplying the processing liquid to the substrate being rotated, while scattering the processing liquid from the substrate by a centrifugal force
Implementation Method 2
dispersing the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard
Data Source
AI summary
A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.