Mist Guard Elevating Mechanism for Semiconductor Substrate Processing
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Solution Overview
Problem
In semiconductor manufacturing, processing liquids scattered during liquid processing on substrates often adhere to the inner walls of the chamber, leading to contamination and humidity issues that affect the substrate and the processing environment.
Innovation Solution
A substrate processing apparatus with a stationary cup and a mist guard having a cylindrical shape and a protruding portion is used, where the mist guard can be elevated to different heights to effectively block scattered processing liquids from reaching the chamber walls, and a method involving the use of this apparatus to perform substrate processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a stationary cup body is used to receive processing liquid, then the processing liquid can be collected, but scattered processing liquid still adheres to the chamber inner wall causing contamination
Solution Approach 1:
The mist guard is designed to be movable between a first position (blocking scattered liquid) and a second position (allowing liquid passage), transforming a static structure into a dynamic one that adapts to different operational requirements. This resolves the contradiction by enabling the system to switch between contamination prevention and liquid collection modes.
Solution Approach 2:
The chamber is divided into multiple zones: the stationary cup body for liquid collection, the movable mist guard for blocking scattered liquid, and the substrate holding unit. This segmentation allows each component to perform its specific function independently, preventing contamination while maintaining collection capability.
2Object-affected harmful factors
If the mist guard is positioned to block scattered liquid, then contamination is reduced, but access to the substrate may be restricted
Solution Approach 1:
The mist guard's movability between first and second positions enables dynamic adjustment: in the first position, it blocks scattered liquid from reaching the chamber wall; in the second position, it moves away to allow unrestricted substrate access and chamber maintenance. This dynamic behavior resolves the contradiction between contamination prevention and operational accessibility.
Solution Approach 2:
The mist guard operates periodically, switching between blocking and non-blocking positions based on processing stages. During liquid processing, it blocks scattered liquid; during substrate loading/unloading or maintenance, it moves to the second position. This periodic action resolves the contradiction by providing contamination protection only when needed.
3Manufacturing precision
If processing liquid is supplied onto the rotating substrate, then liquid processing is performed, but mist and scattered liquid escape beyond the cup body
Solution Approach 1:
The mist guard acts as an intermediary element between the stationary cup body and the chamber wall. It intercepts scattered processing liquid and mist before they can escape beyond the cup body, preventing chamber wall contamination while allowing the liquid processing to proceed normally on the substrate.
Solution Approach 2:
The mist guard captures the harmful scattered processing liquid and mist that would otherwise contaminate the chamber wall, redirecting them into the stationary cup body for collection and proper disposal. This converts the harmful scattering effect into a controlled collection process, resolving the contradiction between processing quality and contamination prevention.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses the adherence of processing liquids to the chamber walls, reducing contamination and improving the drying efficiency by blocking scattered liquids and managing the atmosphere during processing.
Implementation Method 1
a mist guard provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body
Implementation Method 2
a protruding portion protruded above the stationary cup body from an upper portion of the cylindrical portion toward an inside of the cylindrical portion
Data Source
AI summary
A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.