Mist Deposition Nozzle Layout for Uniform Nanoparticle Films
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Solution Overview
Problem
Existing mist deposition apparatuses face challenges in achieving uniform distribution of mist concentration along the longitudinal direction of the slit-shaped ejection port, due to non-uniform distribution of mist supplied from the lateral direction, leading to uneven nanoparticle deposition on substrates.
Innovation Solution
A deposition apparatus with a nozzle design featuring a slit aperture portion and inclined inner wall surfaces that guide the mist gas, ensuring an acute angle intersection with the mist ejection vector, and a moving mechanism to align the substrate with the mist distribution, resulting in improved uniformity of mist flow speed and concentration along the slit aperture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If mist is supplied from the lateral direction into the second space, then mist deposition is achieved, but non-uniform mist distribution in the longitudinal direction results in uneven nanoparticle deposition
Solution Approach 1:
The single lateral mist supply is segmented into multiple mist supply ports positioned at different locations within the internal space. Each port supplies mist to a specific region, ensuring uniform distribution along the longitudinal direction while maintaining the lateral supply capability needed for deposition.
Solution Approach 2:
The mist supply approach transitions from a single lateral direction to a multi-dimensional arrangement with multiple ports at different positions. This spatial reconfiguration in the internal space enables uniform mist distribution while preserving the lateral supply mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves enhanced uniformity of nanoparticle deposition across the substrate surface, reducing droplet formation and improving the consistency of thin film formation, thereby increasing the efficiency and quality of the deposition process.
Implementation Method 1
a space SO surrounded by the inclined inner wall surface 10A and the vertical inner wall surface 11A, and a slot portion SLT formed in a bottom surface Pe of the block member 11
Implementation Method 2
reacting or evaporating a solvent component contained in the mist (solution) adhered to the substrate, and forming a thin film made of the material substance (metal material or the like) on the surface of the substrate
Data Source
AI summary
A deposition apparatus that supplies mist to a front surface of an object and deposits a film made of a material substance containing the mist on the front surface of the object, the deposition apparatus comprising a mist supplying section that includes: a mist generating section that generates the mist; an inlet port that introduces the mist generated by the mist generating section into a space; and a supply port that supplies the mist from the space to the front surface of the object, wherein the supply port is provided at a different position than the inlet port in a first direction, in a first prescribed plane that includes the supply port where the first direction and a second direction intersect and that has the mist pass therethrough.


