Automated Miter and Notch Identification for Sew Line Generation

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Solution Overview

Problem

Current CAD and CAM systems lack efficient methods for automatically identifying and integrating miter and notch alignment guides into pattern sew line generation, leading to inaccuracies and increased human intervention in the design process.

Innovation Solution

A data processing system that automatically identifies miter and notch alignment guides within CAD models, allowing for the generation of sew lines parallel to boundary edges with a predetermined seam allowance, while ignoring alignment guides to maintain a smooth line without offsetting from their locations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If automatic identification of alignment guides is implemented, then productivity and accuracy are improved, but device complexity increases

Engineering Contradiction:
Improvepattern import process efficiencyVSAvoidsystem complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The system automatically identifies alignment guides and generates sew lines without requiring manual user input or intervention. The processor autonomously detects alignment guide features in the pattern data and calculates appropriate sew line positions, making the system self-sufficient and eliminating the need for complex manual操作流程

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system performs preliminary identification of alignment guides and pre-calculates sew line positions before final pattern generation. By analyzing the pattern data in advance to locate alignment guides and determine offset distances, the system prepares all necessary information upfront, streamlining the overall pattern import process

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If alignment guides are ignored for smooth line generation, then manufacturing precision is improved, but measurement precision of alignment features may be compromised

Engineering Contradiction:
Improvesew line accuracyVSAvoidalignment guide location accuracy
Core Design Contradiction:
Manufacturing precisionVSMeasurement precision

Solution Approach 1:

The system extracts and separates the alignment guide features from the boundary edge geometry. By identifying alignment guides as distinct elements and removing them from the continuous boundary edge, the system can generate smooth sew lines that ignore alignment guide interruptions while still accurately capturing their locations for proper seam placement

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The system applies different processing rules to different portions of the boundary edge. Alignment guide portions are treated specially (ignored for seam allowance offset) while other boundary portions are processed normally. This local differentiation allows smooth sew line generation in most areas while maintaining accurate alignment guide positioning where needed

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS10318657B2System and method for miter and notch identification for pattern sew line generation
Publication Date: 2019.06.11 SIEMENS INDUSTRY SOFTWARE INC
  • US10318657B2 patent drawing
  • US10318657B2 patent drawing
  • US10318657B2 patent drawing

AI summary

A system and method is provided that facilitates miter and notch identification for pattern sew line generation. A processor of the system may be configured to access a pattern data that defines a flat shape with cut lines corresponding to locations at which the shape is cut out of a material. Based on the pattern data, the processor may generate a computer-aided-design (CAD) model that includes a plurality of curves that define boundary edges of an object that corresponds to the shape defined by the pattern data. In addition, the processor may automatically identify portions of the boundary edges that correspond to alignment guides including at least one miter alignment guide, notch recess alignment guide, notch projection alignment guide, or combination thereof. Further, the processor may include at least one sew line in the CAD model that is parallel to and offset by the at least one seam allowance distance from at least one boundary edge towards the interior of the CAD model, without being offset by the at least one seam allowance distance from portions of the at least one boundary edge that include the identified alignment guides.