Mixed Gas Supply Buffering for Stable Film-Forming Concentration
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Solution Overview
Problem
Existing gas supply technologies for film forming materials in semiconductor manufacturing face issues with fluctuating concentrations and safety risks due to vapor pressure changes and potential leaks, especially when using toxic and reactive materials.
Innovation Solution
A mixed gas supply device with a raw material container, heaters, carrier gas introduction, pressure adjustment, and buffer tanks to stabilize the concentration and flow rate of film forming gases, incorporating safety measures to prevent leaks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the flow rate of carrier gas is controlled to maintain constant temperature and pressure in the raw material container, then the mixed gas can be supplied at stable concentration, but the concentration of film forming material gas still fluctuates immediately after supply starts and does not reach the set concentration uniformly
Solution Approach 1:
The system performs preliminary actions by pre-heating the raw material container to a temperature higher than the vaporization point before starting gas supply, and by pre-establishing the carrier gas flow rate. This ensures that when supply begins, the film forming material is already in vapor phase and the carrier gas is already flowing at the correct rate, eliminating initial concentration fluctuations and achieving uniform concentration from the start of supply.
2Reliability
If the pressure in the raw material container is controlled to suppress vapor pressure changes, then the concentration of film forming material gas can be stabilized, but the flow rate of mixed gas changes causing the supply amount of film forming material gas to change
Solution Approach 1:
The system employs feedback control by continuously monitoring the concentration of film forming material gas in the mixed gas and adjusting the carrier gas flow rate accordingly. When the measured concentration deviates from the target concentration, the system automatically modifies the carrier gas flow to compensate, thereby maintaining both stable concentration and constant supply amount simultaneously.
3Productivity
If liquid material is supplied through pipes and vaporized by a vaporizer, then the liquid material can be supplied at stable flow rate, but there is a risk of liquid material leaking from pipe joints which creates safety issues for toxic and reactive materials
Solution Approach 1:
The system utilizes phase transition by heating the raw material container to vaporize the liquid film forming material before it enters the supply pipes. By converting the liquid material to vapor phase in a sealed container, the system eliminates the risk of liquid leakage from pipe joints while maintaining stable flow rate through controlled vaporization and carrier gas transport.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device ensures stable and safe supply of mixed gases with controlled concentrations and flow rates, preventing fluctuations and ensuring consistent film formation processes.
Implementation Method 1
a first heater that heats the raw material container
Implementation Method 2
a second heater that heats the mixed gas lead-out path
Implementation Method 3
a pressure adjusting device that is located in the mixed gas lead-out path and that adjusts the pressure in the raw material container
Implementation Method 4
a mixed gas-measuring device that is located in the mixed gas lead-out path on the primary or secondary side of the pressure adjusting device and that measures the concentration or the flow rate of the mixed gas
Implementation Method 5
one or more buffer tanks that are located in the mixed gas lead-out path
Implementation Method 6
a carrier gas-introduction path that introduces a carrier gas into the raw material container
Data Source
AI summary
The present invention addresses the problem of providing a mixed gas supply device that can safely and stably supply a mixed gas containing a film forming material gas. The present invention provides a mixed gas supply device that supplies a mixed gas containing at least one kind of gas of a film forming material by adjusting the concentration of the film forming material in the mixed gas, comprising: a raw material container (2) that contains the film forming material; a first beater (3) that heats the raw material container (2); a carrier gas-introduction path (L1) that introduces a carrier gas into the raw material container (2); a mixed gas-lead-out path (L2) that leads the mixed gas out of the raw material container (2); a second heater (6) that heats the mixed gas lead-out path (L2); a pressure adjusting device (8) that is located in the mixed gas lead-out path (L2) and that adjusts the pressure in the raw material container (2); a mixed gas-measuring device (9) that is located in the mixed gas lead-out path (L2) on the primary or secondary side of the pressure adjusting device (8) and that measures the concentration or the flow rate of the mixed gas; and one or more buffer tanks (10) that are located in the mixed gas lead-out path (12).