Mobile Contaminant Processing Device for Semiconductor Lines
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor manufacturing processes face challenges in effectively measuring and removing particles and chemical gases generated within semiconductor lines, which can contaminate the manufacturing environment and impact process quality.
Innovation Solution
A contaminant processing device is designed to include a body unit, a driving unit, a manipulator, a suction unit, and a controller. The device can move within the semiconductor line, position the suction unit over process chambers, and actively suck in chemical gases and particles using a suction fan and collection unit, with sensors monitoring concentrations and positions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a stationary purification system is used, then the structure is simple, but it cannot effectively remove contaminants generated at specific process chamber locations
Solution Approach 1:
The patent applies the dynamics principle by transforming the stationary purification system into a mobile robot that can move to different process chambers. The robot includes a manipulator arm with a suction unit that can dynamically position itself at various locations within the semiconductor manufacturing facility, enabling effective contaminant removal at specific process chamber locations rather than relying on fixed stationary systems.
Solution Approach 2:
The patent uses an intermediary approach by introducing a mobile robot as a mediator between the contaminant source and the purification function. The robot carries the suction unit and can deliver purification capability to any location in the facility, acting as a mobile intermediary that bridges the gap between stationary structures and the need for location-specific contaminant removal.
2Loss of time
If manual cleaning methods are used, then the device complexity is low, but the time required for contaminant removal is excessive
Solution Approach 1:
The patent applies the self-service principle by designing an autonomous robot that can independently navigate to process chambers, position the suction unit, and perform contaminant removal without human intervention. The robot includes sensors to detect contaminants and automatically executes purification tasks, eliminating the need for manual cleaning operations and significantly reducing the time required for contaminant removal.
Solution Approach 2:
The patent replaces manual mechanical cleaning operations with an automated robotic system. The robot uses a manipulator arm with a suction unit to perform what would otherwise require manual intervention, substituting human labor with an automated mechanical system that can continuously and rapidly remove contaminants from process chambers.
3Adaptability or versatility
If the suction unit is fixed in position, then the device structure is simple, but it cannot adapt to different process chamber locations
Solution Approach 1:
The patent applies the dynamics principle by replacing a fixed suction unit with a mobile, maneuverable system. The manipulator arm can dynamically adjust its position and orientation to reach different process chambers, providing positioning flexibility throughout the facility while maintaining the necessary adaptability to handle various locations and configurations.
Solution Approach 2:
The patent applies the universality principle by designing the manipulator system to perform multiple functions: navigation to different locations, positioning the suction unit at various heights and distances, and adapting to different process chamber configurations. This multi-functional capability allows a single robot design to serve multiple purposes across different areas of the semiconductor manufacturing facility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device continuously measures and removes contaminants, improving the cleanliness and efficiency of semiconductor manufacturing processes by directly addressing particle and gas contamination within the semiconductor line.
Implementation Method 1
a suction fan installed in a first area and sucking in particles and chemical gases
Implementation Method 2
a collection unit installed in a second area and filtering the particles and the chemical gases
Implementation Method 3
a particle sensor measuring the particles
Implementation Method 4
a chemical gas detection sensor measuring the chemical gases
Data Source
AI summary
There is provided a contaminant processing device that measures and removes particles or chemical gases generated within a semiconductor line. The contaminant processing device includes a body unit, a driving unit installed on the body unit and configured to drive inside a semiconductor line, a manipulator installed on an upper surface of the body unit and including a plurality of joints, a suction unit installed on the upper surface of the body unit and connected to the manipulator and a controller that controls the manipulator to position the suction unit on a process chamber inside the semiconductor line and controls the suction unit to suck chemical gas discharged from the process chamber.