Modular ALD System for Large Area Substrate Alignment
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Solution Overview
Problem
Conventional atomic layer deposition (ALD) systems face challenges in achieving efficient and uniform thin film deposition on large areas due to the need for multiple cycles and the complexity of maintaining precise alignment of multiple deposition heads, which increases costs and reduces throughput.
Innovation Solution
A modular ALD system with a plurality of coating modules supported by bars and bar mounting structures, allowing for accurate alignment and operation at atmospheric pressure, enabling continuous gas flow and reduced gas residence time, suitable for large area substrates and moving webs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If multiple deposition heads are used to coat large area substrates, then deposition coverage area is improved, but alignment precision deteriorates due to increased complexity
Solution Approach 1:
The system divides the coating process into multiple independent delivery heads (first, second, third, and fourth delivery heads) that can be independently positioned and controlled. Each delivery head operates separately to deposit alternating atomic layers, allowing the large substrate area to be covered without requiring complex alignment of a single monolithic head. The segmentation enables modular assembly and simplified alignment procedures.
Solution Approach 2:
The patent introduces a vertical dimension to the alignment problem by positioning delivery heads at different heights above the substrate. The first and second delivery heads are positioned at a first height, while the third and fourth delivery heads are positioned at a second height. This vertical separation creates independent alignment planes, reducing the complexity of maintaining precise alignment across the entire coating area.
2Productivity
If conventional CVD techniques are used, then deposition speed is improved, but film quality and conformal coating properties deteriorate
Solution Approach 1:
The system employs periodic alternation between different precursor deliveries in a sequence: first precursor from first delivery head, second precursor from second delivery head, first precursor from third delivery head, second precursor from fourth delivery head, and repeating this cycle. This periodic action enables ALD-like self-limiting surface reactions that ensure uniform conformal coating, while the parallel operation of multiple delivery heads maintains high deposition throughput.
Solution Approach 2:
The patent uses composite precursor molecules containing different elements (e.g., metal precursors and oxygen precursors) that react sequentially on the substrate surface. The composite nature of these precursors allows controlled deposition of complex thin film materials with superior conformal properties, while the multi-head delivery system maintains high deposition rates.
3Productivity
If gas pressure is increased to improve deposition rate, then productivity is improved, but gas residence time increases causing unwanted CVD reaction
Solution Approach 1:
The system uses periodic pulsing of precursors from each delivery head in rapid succession, creating short exposure times for each precursor-gas mixture. This periodic action limits the residence time of individual precursors in the gas phase, preventing unwanted CVD reactions even at elevated pressures, while maintaining high overall deposition throughput through the parallel operation of multiple heads.
Solution Approach 2:
The deposition process is segmented into separate, rapid precursor deliveries from four different delivery heads. Each delivery head introduces its precursor in a brief, controlled pulse, reducing the gas residence time for each precursor individually. The segmentation allows the system to operate at higher pressures for improved throughput while maintaining ALD-like control over reaction timing and preventing parasitic CVD reactions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The modular system enhances deposition efficiency and uniformity, reduces cycle time, and allows for cost-effective coating of large substrates while maintaining precise alignment, improving throughput and adaptability to various substrate types and environments.
Implementation Method 1
one or more of the gas flows from the delivery heads provides a pressure that at least contributes to the separation of the substrate surface from the output faces of the delivery heads
Implementation Method 2
CVD precursors are volatile molecules that are delivered, in a gaseous phase, to a chamber in order to react at the substrate, forming the thin film thereon
Implementation Method 3
Atomic layer deposition (ALD) is an alternative film deposition technology that can provide improved thickness resolution and conformal capabilities compared to its CVD predecessor
Data Source
AI summary
An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating section, at least a first bar and a second bar for supporting the coating modules, and at least a first bar mounting structure and a second bar mounting structure for supporting the bars, wherein each of the coating modules are supported by the first bar and the second bar, and wherein the combination of the at least two coating modules and the first bar and the second bar define a coating section profile for the output faces of the coating modules. Also disclosed is a process for making such apparatus.