Modular Deposition Heads for Uniform Thin Film Coating
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current spatial atomic layer deposition (SALD) systems face challenges in efficiently coating large substrates with uniform thickness, requiring complex equipment or long motion profiles, and struggle to manage gas separation and substrate handling for roll-to-roll processing, especially with small deposition heads and varying substrate form factors.
Innovation Solution
A modular deposition unit with interchangeable SALD heads and a gas manifold system that allows for precise alignment and easy replacement of heads, enabling the use of multiple smaller heads in an extensible array to cover wider areas and maintain gas separation, while accommodating different substrate sizes and forms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a single large deposition head is used to coat large substrates, then coating area is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent divides the coating system into multiple smaller deposition heads (first deposition head, second deposition head, etc.) that can be independently mounted on the substrate support. Each head has its own gas delivery system and controls, allowing the large coating area to be achieved through parallel operation of multiple simple units rather than one complex large unit. The segmentation enables independent optimization and maintenance of each head while collectively covering the entire substrate area.
2Area of stationary object
If multiple deposition heads are used to increase coating area, then coating area is improved, but gas separation and control complexity increases
Solution Approach 1:
Each deposition head is designed with localized gas delivery features including dedicated gas inlet ports, internal passageways, and outlet apertures positioned to create distinct gas flow zones. The gas delivery system provides separate gas supplies to each head, allowing independent control of precursor flows. This local quality approach ensures that while multiple heads operate simultaneously, each maintains its own gas chemistry environment, preventing unwanted cross-contamination and simplifying overall gas management.
3Ease of operation
If a deposition head smaller than the substrate is used, then ease of substrate handling is improved, but deposition uniformity across the substrate deteriorates
Solution Approach 1:
Multiple small deposition heads are positioned at different locations on the substrate support to collectively cover the entire substrate area. The heads are arranged in a spatial configuration where their coating zones overlap or abut, creating a unified coating field across the substrate. By merging the output of multiple simple heads, the system achieves both the ease of handling small individual heads and the uniformity of complete substrate coverage.
4Reliability
If complex equipment is used to maintain gas separation, then gas separation is improved, but device complexity and cost increase
Solution Approach 1:
The gas delivery system is designed so that each deposition head self-regulates its gas flow through internal passageways and outlet geometries that naturally direct precursor gases onto the substrate and allow excess gas to dissipate in controlled patterns. The spatial arrangement of multiple heads with their own dedicated gas supplies creates inherent gas separation through distance and directional flow, eliminating the need for complex external gas management equipment while maintaining reliable separation between different precursor zones.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for precise, repeatable, and efficient thin-film deposition on large substrates with uniform thickness, reducing manufacturing costs and complexity, and enabling roll-to-roll processing with improved substrate handling and gas separation.
Implementation Method 1
gas passages connecting each of the gas openings on the output face to one of the deposition head gas ports
Implementation Method 2
Among the techniques widely used for thin-film deposition is chemical vapor deposition (CVD), which uses chemically reactive molecules that react to deposit a desired film on a substrate
Implementation Method 3
the mounting face of each deposition head and the attachment face of the gas manifold include alignment features for aligning each deposition head with the interface region of the gas manifold
Implementation Method 4
sealing elements positioned between the manifold gas ports and the deposition head gas ports
Data Source
Figure 1
Figure 2A~2B
Figure 2C
AI summary
A deposition unit for a thin film deposition system includes one or more of deposition heads and a gas manifold. Each deposition head includes an output face having a plurality of gas openings, a mounting face including a plurality of deposition head gas ports, and connecting gas passages. The gas manifold includes an attachment face having one or more interface regions, each interface region including a plurality of manifold gas ports in positions corresponding to the deposition head gas ports. Each deposition head is fastened to the gas manifold in an interface region with sealing elements positioned between the manifold gas ports and the deposition head gas ports. The mounting face of each deposition head and the attachment face of the gas manifold include alignment features for aligning each deposition head with the interface region of the gas manifold.