Modular High-Frequency Source for Uniform Large-Substrate Plasma
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
High-frequency radiation systems, particularly those using a single antenna, face limitations in generating uniform plasma density and geometry matching for large substrates, leading to non-uniform radiation fields and difficulty in accommodating substrate nonuniformity in processes like semiconductor and display manufacturing.
Innovation Solution
A modular high-frequency emission source comprising an array of modules, each with an oscillator, amplification, and applicator, utilizing solid-state electronics to eliminate waveguides and allow for flexible, tunable radiation field and plasma density adjustments, enabling uniform exposure and accommodating substrate size and shape variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a single large magnetron and waveguide system is used to generate microwave plasma, then high power radiation can be transmitted, but the system size becomes large and the radiation field geometry is constrained to waveguide shapes
Solution Approach 1:
The patent divides the single large magnetron system into multiple smaller magnetrons arranged in an array. Each magnetron feeds a separate applicator module, eliminating the need for large waveguides and associated components. This segmentation allows the system to achieve the same total power transmission while reducing overall system size and removing geometry constraints.
Solution Approach 2:
The patent transitions from a single-point radiation source (single magnetron) to a distributed array of radiation sources (multiple magnetrons with applicators). This dimensional change from 0D to 2D/3D source distribution enables flexible radiation field geometry that can be tailored to match substrate shapes and sizes.
2Power
If waveguides and associated components are used to transmit microwave radiation, then power transmission is efficient, but the construction is limited to large systems and design flexibility is severely limited
Solution Approach 1:
The patent eliminates the need for waveguides by segmenting the power transmission into multiple independent paths, each consisting of a magnetron directly coupled to an applicator module. This removes the bottleneck of waveguide-based transmission and allows each module to be independently configured for different substrates and processing requirements.
Solution Approach 2:
The patent creates a dynamically reconfigurable system where individual applicator modules can be independently positioned, adjusted, and controlled. This dynamic flexibility allows the system to adapt to different substrate geometries, sizes, and processing requirements, unlike the static waveguide-based systems.
3Illumination intensity
If a slot line antenna is used to spread microwave energy over an extended surface, then energy distribution is improved, but the system becomes complicated and is limited in power density coupling to plasma
Solution Approach 1:
The patent replaces the single slot line antenna with multiple discrete applicator modules, each with its own magnetron. This segmentation allows energy to be distributed across multiple independent sources, achieving uniform energy distribution while maintaining high power density coupling capability in each local region.
Solution Approach 2:
The patent enables different regions of the processing chamber to have different power densities by independently controlling each applicator module. This local quality control allows optimization of power coupling in different areas based on local plasma formation requirements, unlike the uniform but limited power density of slot line antennas.
4Device complexity
If high-frequency radiation systems use a single antenna, then system construction is simplified, but plasma density uniformity and spatial tunability are poor
Solution Approach 1:
The patent divides the single antenna system into multiple applicator modules distributed across the processing chamber. While this increases component count, each module is simple and standardized, allowing independent optimization of plasma density in different regions while maintaining overall system manageability.
Solution Approach 2:
The patent enables spatially varying plasma density by independently controlling the power and positioning of each applicator module. This allows high manufacturing precision in terms of plasma uniformity and spatial control, with each module tailored to local processing requirements.
5Productivity
If substrates increase in size, then processing capacity is improved, but edge effects become increasingly difficult to control and processing uniformity deteriorates
Solution Approach 1:
The patent uses an array of applicator modules that can be distributed across large substrate areas. This segmentation allows the processing zone to scale with substrate size while maintaining uniform plasma density and controlling edge effects through independent module control.
Solution Approach 2:
The patent enables local optimization of processing parameters for different regions of large substrates. By independently controlling power distribution to individual applicator modules, the system can compensate for edge effects and maintain processing uniformity across the entire substrate surface.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The modular design provides increased power density and flexibility, allowing for uniform plasma formation and radiation exposure across large substrates, improving processing uniformity and accommodating substrate nonuniformities, with independently controlled modules and feedback systems for optimized power distribution.
Implementation Method 1
the oscillator module comprises a voltage control circuit and a voltage controlled oscillator
Implementation Method 2
the amplification module amplifies the output high-frequency electromagnetic radiation from the voltage controlled oscillator
Implementation Method 3
the applicator is coupled to the amplification module
Data Source
AI summary
Embodiments include a modular high-frequency emission source. In an embodiment, the modular high-frequency emission source includes a plurality of high-frequency emission modules, where each high-frequency emission module comprises and oscillator module, an amplification module, and an applicator. In an embodiment the oscillator module comprises a voltage control circuit and a voltage controlled oscillator. In an embodiment, the amplification module is coupled to the oscillator module. In an embodiment, the applicator is coupled to the amplification module. In an embodiment, each high-frequency emission module includes a different oscillator module.


