Modular High-Frequency Source for Uniform Plasma Fields
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Solution Overview
Problem
High-frequency radiation systems, particularly those using a single antenna, face challenges in creating uniform plasma fields and accommodating large substrate sizes due to geometric constraints and limited power density, leading to nonuniform processing and difficulty in adjusting radiation field and plasma density.
Innovation Solution
A modular high-frequency emission source with an array of high-frequency emission modules, each comprising an oscillator and amplification module, integrated into an applicator frame with a gas distribution system, allowing for flexible configuration and independent power control to match substrate geometry and adjust radiation field and plasma density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a single large microwave source with waveguide is used, then high power is achieved, but the system size becomes large and geometry is constrained
Solution Approach 1:
The patent divides a single large microwave source into multiple smaller microwave emission modules (e.g., 4, 9, or 16 modules). Each module independently generates microwave radiation and can be positioned at different locations within the processing chamber, eliminating the need for a single large waveguide system and associated tuning components.
Solution Approach 2:
Multiple microwave emission modules are combined to work together in unison, with their individual microwave fields merging to create a unified plasma generation system. The modules can be phased and synchronized to produce constructive interference patterns that enhance plasma uniformity across the substrate surface.
2Device complexity
If a single antenna is used, then system simplicity is maintained, but plasma uniformity and spatial tunability are limited
Solution Approach 1:
The single antenna is segmented into multiple independent emission modules, each capable of being individually controlled in terms of power level, phase, and timing. This segmentation enables spatially selective plasma generation and allows for tuning the plasma density distribution across different regions of the substrate.
Solution Approach 2:
The system incorporates dynamic control capabilities where each microwave emission module can be independently adjusted in real-time. This includes variable power levels, phase shifting, and pulsed operation modes, allowing the plasma field to be dynamically tuned to match substrate requirements and compensate for edge effects or nonuniformities.
3Loss of energy
If waveguide geometry is used, then microwave transmission is efficient, but radiation field geometry is constrained
Solution Approach 1:
Instead of using a single waveguide that imposes its geometric constraints, the system uses multiple small emission modules that can be positioned flexibly throughout the chamber. Each module creates a localized microwave field that can be independently shaped and directed, allowing the overall radiation field geometry to be adapted to match various substrate shapes and sizes without being constrained by waveguide dimensions.
4Area of stationary object
If slot line antenna is used to spread microwave energy, then extended surface coverage is achieved, but power density and system complexity are limited
Solution Approach 1:
The slot line antenna approach is replaced by multiple discrete emission modules distributed across the chamber. This segmentation allows each module to concentrate microwave power into a focused beam, achieving high power density at each location while the collective arrangement of multiple modules provides extended surface coverage across the entire substrate area.
Solution Approach 2:
Each microwave emission module can be independently optimized to provide high power density at its specific location. The local plasma density and power coupling can be tailored to match the local requirements of different substrate regions, such as providing enhanced power density at the center or edges as needed, rather than using a uniform distribution approach.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of uniform and arbitrarily large plasma fields with increased power density, improving processing uniformity and accommodating substrate nonuniformities, such as edge effects and radial velocity variations.
Implementation Method 1
modular high-frequency emission source that includes an array of high-frequency emission modules, each of which includes an oscillator module and an amplification module
Implementation Method 2
plasmas generated with higher frequencies, including microwave frequencies, a plasma with higher plasma density and/or a plasma with a high concentration of excited neutral species are formed
Data Source
AI summary
Embodiments described herein include an applicator frame for a processing chamber. In an embodiment, the applicator frame comprises a first major surface of the applicator frame and a second major surface of the applicator frame opposite the first major surface. In an embodiment, the applicator frame further comprises a through hole, wherein the through hole extends entirely through the applicator frame. In an embodiment, the applicator frame also comprises a lateral channel embedded in the applicator frame. In an embodiment the lateral channel intersects the through hole.