Modular Microwave Plasma Source for Uniform Large-Substrate Processing

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Solution Overview

Problem

Current microwave plasma sources face limitations in generating uniform plasma with spatially tunable density, particularly for larger substrates, due to the constraints of waveguide-based systems, which restrict plasma geometry and power density, and are not adaptable to nonuniform substrate processing.

Innovation Solution

A modular microwave plasma source utilizing solid-state electronics and dielectric resonators, allowing for flexible array configurations and independent power control of each module, enabling uniform plasma formation over large areas and accommodating substrate nonuniformities through feedback-controlled power adjustment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a waveguide-based microwave plasma source is used, then microwave power can be transmitted to the processing chamber, but the plasma geometry is constrained by the waveguide shape and cannot match the substrate geometry

Engineering Contradiction:
Improveplasma geometry adaptabilityVSAvoidwaveguide system complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent divides the plasma source into multiple independent modular microwave sources, each with its own applicator. These modules can be independently controlled and positioned to match the substrate geometry, eliminating the constraint of fixed waveguide shapes while maintaining microwave power transmission capability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from a single-dimensional waveguide transmission path to a multi-dimensional array of modular applicators that can be positioned in three-dimensional space above the substrate. This allows the plasma geometry to be shaped and positioned to match various substrate configurations.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If a single large microwave source is used, then high power plasma can be generated, but the plasma density cannot be spatially tuned or made uniform across large substrates

Engineering Contradiction:
Improveplasma uniformityVSAvoidspatial plasma density tuning
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent segments the single large microwave source into multiple smaller modular sources, each contributing to a portion of the overall plasma. This allows independent control of plasma density in different spatial regions, enabling both uniformity across large substrates and spatial tuning capabilities.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements dynamic control of each modular microwave source, allowing real-time adjustment of power levels to each module. This enables spatial tuning of plasma density and compensation for edge effects during processing, achieving uniformity across large substrates.

Inventive Principle:
Principle #15Dynamics

3Power

If waveguide components are used to transmit microwave radiation, then power transmission is achieved, but the system size becomes large and design flexibility is severely limited

Engineering Contradiction:
Improvemicrowave power transmissionVSAvoidsystem size
Core Design Contradiction:
PowerVSDevice complexity

Solution Approach 1:

The patent replaces the single large waveguide system with multiple compact modular units, each containing its own microwave generation and applicator components. This segmentation reduces the overall system footprint while maintaining power transmission capability through distributed architecture.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent replaces the mechanical waveguide transmission system with a more compact configuration where solid-state microwave sources directly couple to applicators positioned near the substrate. This substitution eliminates the need for large waveguide components and associated mechanical tuning elements.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Area of stationary object

If slot line antenna is used to spread microwave energy, then extended surface coverage is achieved, but the system becomes complicated and power density is limited

Engineering Contradiction:
Improveplasma coverage areaVSAvoidantenna system complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent replaces the single complex slot line antenna with multiple simpler applicator modules distributed across the substrate area. Each applicator is a simplified version that can be independently positioned, achieving extended coverage through modular deployment rather than a single complex structure.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent changes the fundamental parameter of power density by using multiple modular sources that can be independently controlled. This allows higher power density at each module while achieving extended coverage through the collective output of multiple modules, unlike the distributed low-power density of slot line antennas.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The modular design achieves higher power density and plasma uniformity, enabling efficient processing of larger substrates with adjustable plasma density, improved edge effect handling, and enhanced processing flexibility, surpassing traditional RF plasma systems.

Implementation Method 1

a voltage controlled oscillator, where an output voltage from the voltage control circuit drives oscillation in the voltage controlled oscillator

Methodology Applied
Scientific EffectOscillation: Harmonic Oscillator

Implementation Method 2

a solid state microwave amplification module coupled to the voltage controlled oscillator. In an embodiment, the solid state microwave amplification module amplifies an output from the voltage controlled oscillator

Methodology Applied
Scientific EffectMicrowave amplification: Magnetic Amplifier

Implementation Method 3

an applicator coupled to the solid state microwave amplification module, where the applicator is a dielectric resonator

Methodology Applied
Scientific EffectDielectric heating: Dielectric Heating

Implementation Method 4

an applicator coupled to the solid state microwave amplification module, where the applicator is a dielectric resonator

Methodology Applied
Scientific EffectResonance: Resonance

Implementation Method 5

an array of applicators, where the array of applicators are positioned opposing a chuck in the processing chamber on which one or more substrates are processed

Methodology Applied
Scientific EffectIonization: Ionisation

Data Source

PatentUS20220344131A1Modular microwave plasma source
Publication Date: 2022.10.27 APPLIED MATERIALS INC
  • US20220344131A1 patent drawing
  • US20220344131A1 patent drawing
  • US20220344131A1 patent drawing

AI summary

Embodiments include a modular microwave source. In an embodiment, the modular microwave source comprises a voltage control circuit, a voltage controlled oscillator, where an output voltage from the voltage control circuit drives oscillation in the voltage controlled oscillator. The modular microwave source may also include a solid state microwave amplification module coupled to the voltage controlled oscillator. In an embodiment, the solid state microwave amplification module amplifies an output from the voltage controlled oscillator. The modular microwave source may also include an applicator coupled to the solid state microwave amplification module, where the applicator is a dielectric resonator.