Modular Pulsed Voltage Source for Fast Plasma Pulse Switching

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Solution Overview

Problem

Producing high voltage pulses with fast rise and fall times is challenging, especially in circuits with high capacitance loads, and existing technologies struggle to achieve steep slopes efficiently in a compact manner with variable pulse widths, voltages, and repetition rates.

Innovation Solution

A high voltage switch comprising multiple switch modules with transformers and isolated power supplies, allowing for the generation of high voltage pulses with rise times less than 100 ns and frequencies greater than 10 kHz, using a series configuration of switch modules with transformer cores and secondary windings to minimize stray capacitance and inductance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If standard electrical components are used to produce high voltage pulses, then the circuit design is simpler, but the rise time and fall time become excessively long and the slope becomes insufficient

Engineering Contradiction:
Improverise time and fall timeVSAvoidcircuit complexity
Core Design Contradiction:
SpeedVSDevice complexity

Solution Approach 1:

The high voltage pulse generation circuit is divided into multiple modular switch modules (first switch module, second switch module, etc.), each containing a switch, transformer, and trigger. This segmentation allows each module to be optimized independently for fast switching while maintaining overall system functionality, achieving rise times less than 100 ns without excessive complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs dynamic switching control where switches are turned on and off in specific sequences to generate high voltage pulses with steep slopes. The dynamic operation of switches S1-S4 in combination with transformers T1-T4 enables rapid voltage transitions (greater than 10^11 V/s) by controlling the timing and duration of switch closure, achieving fast rise and fall times adaptively.

Inventive Principle:
Principle #15Dynamics

2Speed

If the pulse slope is increased to achieve fast rise time, then the rise time improves, but the difficulty of producing such steep slopes increases dramatically

Engineering Contradiction:
Improvepulse slopeVSAvoidease of producing steep slopes
Core Design Contradiction:
SpeedVSEase of manufacture

Solution Approach 1:

Transformers are introduced as intermediary components between the low voltage control circuitry and the high voltage output. The transformers step up the voltage while the switch modules control the timing, mediating between the easy-to-control low voltage side and the high voltage output side. This allows steep slopes (greater than 10^11 V/s) to be achieved without directly manipulating high voltage switches, making the system easier to manufacture and control.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes multiple parameters simultaneously: voltage (stepping up from control voltage to high voltage), time (achieving rise times less than 100 ns), and frequency (operating at greater than 10 kHz). By coordinating these parameter changes through the switch modules and transformers, the system achieves steep pulse slopes that would be difficult to produce with fixed parameter designs.

Inventive Principle:
Principle #35Parameter changes

3Adaptability or versatility

If high voltage pulses with variable pulse widths, voltages, and repetition rates are produced, then the adaptability improves, but the device complexity increases

Engineering Contradiction:
Improvevariable pulse parametersVSAvoidcontrol circuit complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The switch modules are designed with universal functionality to handle multiple operating conditions. Each module can operate independently or in combination with others, allowing the same hardware configuration to produce variable pulse widths, voltages, and repetition rates. The controllers can adjust the timing and sequencing of switch modules to achieve different pulse parameters without requiring additional hardware, maintaining simplicity while providing versatility.

Inventive Principle:
Principle #6Universality (Multi-functionality)

4Quantity of substance

If circuits with high capacitance loads are used, then the energy storage capacity increases, but the ability to achieve fast rise time and fall time deteriorates

Engineering Contradiction:
ImprovecapacitanceVSAvoidrise time and fall time
Core Design Contradiction:
Quantity of substanceVSSpeed

Solution Approach 1:

The patent employs periodic switching action where switches are turned on and off in rapid succession to charge and discharge capacitive loads. By using multiple switch modules operating in sequence with periods less than 100 ns, the system can deliver high current pulses to charged capacitive loads while maintaining fast rise and fall times. The periodic recharging of capacitors through the switch modules allows sustained high-speed operation even with high capacitance loads.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables the production of high voltage pulses with steep rise and fall times, efficiently handling capacitive loads and achieving uniform electric fields across wafers, thereby improving wafer yield and reducing defects.

Implementation Method 1

a first transformer electrically coupled with a control voltage power source and electrically coupled with the first switch, providing a voltage less than the first voltage rating

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Data Source

PatentUS20240379328A1Pulsed voltage source for plasma processing applications
Publication Date: 2024.11.14 EAGLE HARBOR TECHNOLOGIES INC
  • US20240379328A1 patent drawing
  • US20240379328A1 patent drawing
  • US20240379328A1 patent drawing

AI summary

Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; a ground reference; a transformer having a first transformer ratio, the first transformer comprising: a primary winding coupled to the first voltage source and the ground reference; and a secondary winding having a first end and a second end, wherein the first end is coupled to the ground reference, and the second end is configured to be coupled to a load through a common node; and a first diode coupled in parallel with the primary winding of the first transformer. The waveform generator generally also includes one or more additional voltage stages coupled to a load through the common node.