Modular Substrate Processing Apparatus with Configurable Middle Block
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate-processing apparatuses face inefficiencies due to varying process times, leading to increased waiting times and overload on substrate-transferring robots, and not all processing units are utilized in every process, resulting in reduced throughput.
Innovation Solution
The apparatus is designed with a modular structure featuring multiple processing blocks, including upper and lower unit blocks for coating and developing, and a middle block that can be configured based on process recipes, along with intra-chamber robots and transfer robots to manage substrate transfer and simultaneous heating and cooling processes, reducing the load on transfer robots and allowing for flexible process execution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a substrate-transferring robot transfers substrates between processing units with different process times, then the substrate can be processed through multiple units, but the waiting time of substrates increases and the robot becomes overloaded
Solution Approach 1:
The processing apparatus is divided into multiple independent processing blocks (first processing block with coating and developing units, second processing block with heat-treating units). Each block can operate independently and simultaneously, allowing substrates to be processed in parallel without requiring sequential transfer through all units, thereby reducing waiting time while maintaining high throughput.
2Adaptability or versatility
If all processing units are always available, then the apparatus can handle various process recipes, but some units remain unused in certain processes reducing overall efficiency
Solution Approach 1:
The middle unit block is detachably disposed between the upper and lower unit blocks, allowing the configuration of processing units to be dynamically adjusted based on the required process recipe. This enables the system to adapt to different process requirements while ensuring that only the necessary units are active, thereby maximizing throughput without sacrificing versatility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves throughput by reducing the load on transfer robots and enabling simultaneous or continuous baking and cooling processes, optimizing the use of processing units and enhancing overall efficiency.
Implementation Method 1
a heating plate configured to heat the substrates
Implementation Method 2
a cooling plate disposed on one side of the heating plate in a direction parallel to an arrangement direction of the first, second and third unit blocks to cool the substrates
Data Source
AI summary
In a substrate-processing apparatus for performing coating, baking and developing processes on a semiconductor substrate, a first processing block performs a coating process and a developing process on substrates. A second processing block is disposed opposite to the first processing block to heat-treat the substrates. The first processing block includes upper, middle and lower unit blocks. The upper and lower blocks include at least one coating unit for forming a layer on the substrates and at least one developing unit for developing a photoresist layer on the substrates, respectively. The middle unit block is detachably disposed between the upper and lower unit blocks and includes at least one of coating units and developing units. The configuration of the middle unit block may vary according to a process recipe to improve the throughput of the substrate-processing apparatus.