Modulated Beam Curing for Optical Aberration Compensation
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Solution Overview
Problem
Current lithographic systems face challenges in achieving sub-nanometer wavefront control and aberration correction, which is crucial for precise pattern transfer in integrated circuit manufacturing, as existing methods are either invasive or lack effective aberration compensation.
Innovation Solution
A method and system that determine optical aberrations in a lithographic apparatus and use a modulated energy beam to cure a layer of optical cement with a specific illumination profile, compensating for these aberrations to improve wavefront control and alignment precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional aberration correction methods are used, then manufacturing complexity increases or effectiveness decreases, but sub-nanometer wavefront control precision cannot be achieved
Solution Approach 1:
The patent applies preliminary action by determining the illumination profile based on optical aberrations before curing the optical cement. The processor calculates the specific illumination pattern that will compensate for measured aberrations, and then this pre-calculated profile is applied during the curing process, ensuring sub-nanometer wavefront control is achieved before the optical device is finalized
Solution Approach 2:
The patent utilizes parameter changes by modifying the illumination profile parameters (intensity distribution, spatial pattern) based on the measured optical aberrations. The processor adjusts these parameters to create a compensatory illumination pattern that corrects wavefront errors, enabling precise aberration control without adding complex hardware
2Manufacturing precision
If invasive aberration correction methods are used, then wavefront control improves, but system reliability or ease of operation deteriorates
Solution Approach 1:
The patent replaces mechanical or physical invasive correction methods with an optical/electronic solution. Instead of using mechanical adjustment mechanisms or invasive physical modifications to correct aberrations, the system uses a processor to calculate and apply a computational illumination profile that compensates for aberrations, maintaining system reliability while improving ease of operation
Solution Approach 2:
The patent introduces an intermediary - the modulated energy beam with specific illumination profile - that acts as a mediator between the measured optical aberrations and the final wavefront correction. This intermediary enables non-invasive correction by transferring the correction information through the optical cement curing process without directly interfering with the optical components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables sub-nanometer wavefront control and aberration correction, enhancing the precision of pattern transfer and alignment in lithographic systems, thereby improving the manufacturing of integrated circuits.
Implementation Method 1
curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile
Data Source
AI summary
A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile.