Modulation Doped Semiconductor Laser Carrier Concentration Control

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Solution Overview

Problem

In modulation doped semiconductor lasers, the diffusion of p-type dopants like zinc during crystal growth leads to unintended increases in carrier concentration in multiple quantum well layers, affecting the desired carrier density and laser characteristics.

Innovation Solution

A multiple quantum well structure is implemented with alternately stacked layers containing both acceptor and donor impurities, where the p-type carrier concentration is maintained within specific ranges in both barrier and quantum well layers, using Si as a donor and Zn or Mg as acceptors, with Si having minimal diffusion to prevent carrier concentration imbalance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If zinc is used as a p-type dopant in the barrier layer during MOCVD crystal growth, then the p-type carrier concentration in the barrier layer can be controlled, but the zinc diffuses into the multiple quantum well layers causing unintended increase in carrier concentration

Engineering Contradiction:
Improvep-type carrier concentration control in barrier layerVSAvoidcarrier concentration distribution in multiple quantum well layers
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent applies preliminary anti-action by introducing donor impurities (n-type dopants) into the multiple quantum well layers in advance, before the diffusion of acceptor impurities occurs during crystal growth. This pre-introduced donor impurity creates a compensating effect that counteracts the unwanted increase in carrier concentration caused by acceptor diffusion, thereby maintaining the desired carrier concentration distribution and device performance

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The patent employs parameter changes by deliberately adjusting the carrier concentration parameters in the multiple quantum well layers through controlled introduction of donor impurities. By changing the donor impurity concentration parameter, the patent compensates for the acceptor diffusion effect and maintains optimal carrier concentration for laser operation, transforming the harmful diffusion effect into a controllable parameter adjustment

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively maintains the desired carrier concentrations, reducing diffusion effects and ensuring the desired laser characteristics, such as high-speed response and efficient light coupling, while minimizing the impact of dopant diffusion.

Implementation Method 1

Zn tends to diffuse during crystal growth

Methodology Applied
Scientific EffectDiffusion: Diffusion

Implementation Method 2

Si having minimal diffusion to prevent carrier concentration imbalance

Methodology Applied
Scientific EffectDiffusion resistance: Diffusion Barrier

Data Source

PatentUS11196232B2Modulation doped semiconductor laser and manufacturing method therefor
Publication Date: 2021.12.07 LUMENTUMRADIANT GMBH
  • US11196232B2 patent drawing
  • US11196232B2 patent drawing
  • US11196232B2 patent drawing

AI summary

A modulation doped semiconductor laser includes a multiple quantum well composed of a plurality of layers including a plurality of first layers and a plurality of second layers stacked alternately and including an acceptor and a donor; a p-type semiconductor layer in contact with an uppermost layer of the plurality of layers; and an n-type semiconductor layer in contact with a lowermost layer of the plurality of layers, the plurality of first layers including the acceptor so that a p-type carrier concentration is 10% or more and 150% or less of the p-type semiconductor layer, the plurality of second layers containing the acceptor so that the p-type carrier concentration is 10% or more and 150% or less of the p-type semiconductor layer, the plurality of second layers containing the donor, and an effective carrier concentration corresponding to a difference between the p-type carrier concentration and an n-type carrier concentration is 10% or less of the p-type carrier concentration of the plurality of second layers.