Spatial Light Modulation Map for Continuous Nanoimprint Illumination

The system performs preliminary actions by generating a distortion model from test data before actual production use. The modulation map generation process includes pre-computation of correction factors for optical distortions, allowing the system to compensate for known issues before they affect manufacturing precision. This preliminary characterization of the optical path enables subsequent defect-free operation.

The patent introduces an intermediary distortion model that mediates between the desired target light pattern and the actual illumination pattern. This model acts as a bridge, translating ideal patterns into corrected modulation maps that account for optical distortions. The intermediary process includes generating test modulation maps, measuring actual patterns, and computing correction algorithms that reconcile the discrepancy between intended and actual illumination.

The system applies local quality by generating modulation maps with spatially varying characteristics. Different regions of the modulation map have different properties - particularly near mesa sidewalls where discontinuities are filled to prevent defects. The algorithm identifies problem areas and applies localized corrections rather than uniform processing across the entire field, enabling defect reduction without requiring system-wide complexity increases.

The patent changes parameters of the modulation map dynamically based on position and detected discontinuities. The system adjusts modulation values, fill factors, and pattern characteristics locally to optimize radiation distribution. By varying these parameters in response to detected issues, the system achieves reliable defect-free operation while maintaining relatively simple control architecture.

The system applies partial action by selectively filling only the discontinuities that are detected in the pixelated intermediate map, rather than processing the entire map uniformly. The algorithm identifies specific problem areas near mesa sidewalls and applies corrections only where needed. This selective approach achieves sufficient light pattern approximation for manufacturing precision without the computational overhead of exhaustive processing.

The patent uses copying by creating a distortion model from test measurements that can be reused for subsequent production runs. Instead of performing complex computations for every production cycle, the system captures the optical distortion characteristics once and applies this copied model repeatedly. This approach maintains high manufacturing precision while significantly reducing computational complexity during actual manufacturing operations.