Molecular Glass Resist Composition for Nanometer Patterning
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Solution Overview
Problem
Current molecular glass resists face challenges in nanometer-scale patterning due to potential mass loss during removal of protecting groups and compromised pattern quality due to low glass transition temperatures.
Innovation Solution
A composition of matter is disclosed, resulting from a chemical reaction between a malonate ester and an imidamide in the presence of a halogen donor, which forms ester products with acid labile groups, enabling improved resist materials with enhanced pattern retention and integrity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If protecting groups are removed in positive tone molecular resists, then deprotection occurs, but mass loss of up to approximately 50% occurs leading to loss of pattern quality
Solution Approach 1:
The patent converts the harmful mass loss during deprotection into a beneficial outcome by designing a negative tone resist system where the removal of protecting groups from the molecular glass results in increased solubility and pattern formation, rather than mass loss. The acid-labile protecting groups are strategically placed so their removal enhances the desired resist performance while minimizing detrimental effects.
Solution Approach 2:
The patent changes the fundamental parameter of resist tone from positive to negative, and modifies the molecular glass structure to contain multiple acid-labile protecting groups that can be selectively removed. This parameter change transforms the deprotection process from a mass-loss mechanism into a solubility-enhancement mechanism that preserves pattern quality.
2Manufacturing precision
If small molecules are used as resist matrix material to achieve nanometer-scale patterning, then resolution improves, but glass transition temperatures decrease compromising pattern quality
Solution Approach 1:
The patent creates a composite molecular glass structure by combining multiple functional units within a single molecule: the core aromatic structure provides rigidity and high glass transition temperature, while the attached acid-labile protecting groups provide the necessary solubility modulation. This composite approach allows the material to simultaneously achieve nanometer-scale patterning resolution and maintain thermal stability above 100°C.
Solution Approach 2:
The patent segments the molecular glass into distinct functional domains: a rigid aromatic core structure that determines thermal properties and a peripheral region with acid-labile protecting groups that controls solubility and reactivity. This segmentation allows independent optimization of glass transition temperature and patterning resolution.
3Ease of operation
If conventional ultraviolet light is used for photolithography, then processing is simpler, but the minimum feature size is limited and cannot achieve nanometer-scale dimensions
Solution Approach 1:
The patent changes the wavelength parameter of the actinic radiation from conventional ultraviolet (365 nm) to deep ultraviolet (193 nm) or extreme ultraviolet (13.5 nm). This parameter change enables nanometer-scale patterning while the molecular glass resist composition is specifically designed to be sensitive to these shorter wavelengths through its aromatic core structure and photoacid generator compatibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed composition enhances the sensitivity and pattern quality of molecular glass resists by minimizing mass loss and maintaining material integrity during the patterning process.
Implementation Method 1
The acid produced by the PAG reacts catalytically with the polymer to cause it to lose a functional group
Implementation Method 2
The acid produced by the PAG reacts catalytically with the polymer to cause it to lose a functional group or, alternatively, cause a crosslinking event
Implementation Method 3
The speed of the reaction can be driven, for example, by heating the resist film
Data Source
AI summary
Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV);wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.