Molecular Glass Resist Composition for Nanometer Patterning
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Solution Overview
Problem
Current molecular glass resists face challenges in nanometer-scale patterning due to potential mass loss during removal of protecting groups and low glass transition temperatures, which can compromise pattern quality.
Innovation Solution
A composition of matter is developed, comprising an ester formed from a chemical reaction between a malonate ester and an imidamide in the presence of a halogen donor, which includes acid labile groups and ring structures, enhancing the stability and integrity of the resist material.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If protecting groups are removed from molecular glass resists to enable patterning, then the resist can be developed and patterned, but mass loss occurs leading to loss of pattern quality
Solution Approach 1:
The patent changes the chemical parameters of the resist material by incorporating specific molecular structures (such as cyclophane derivatives with controlled glass transition temperatures and acid-labile protecting groups) that modify the removal characteristics. This allows the protecting groups to be removed with minimal mass loss while maintaining pattern quality.
Solution Approach 2:
The patent uses composite molecular structures combining multiple functional elements: the core resist material, acid-labile protecting groups, and specific ring structures. This composite approach allows the material to exhibit both the desired patterning properties and reduced mass loss during development.
2Ease of operation
If low glass transition temperature materials are used in molecular glass resists to improve molecular mobility and patterning, then resist processing is enhanced, but material integrity and pattern quality are compromised
Solution Approach 1:
The patent precisely controls the glass transition temperature parameter within an optimal range (e.g., -50°C to 0°C) to achieve the right balance between molecular mobility for patterning and structural integrity for pattern quality. This parameter optimization resolves the contradiction between ease of processing and material reliability.
3Ease of manufacture
If conventional ultraviolet light is used for photolithography, then the process is simple and well-established, but the minimum feature size is limited and cannot achieve nanometer-scale patterning
Solution Approach 1:
The patent changes the wavelength parameter of the actinic radiation from conventional ultraviolet (e.g., 193 nm) to extreme ultraviolet (e.g., 13.5 nm). This parameter change enables nanometer-scale patterning while the patent maintains process simplicity through optimized resist formulations designed specifically for the new wavelength regime.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution improves the stability and integrity of molecular glass resists, reducing mass loss and maintaining pattern quality during the patterning process, thereby addressing the limitations of existing molecular glass resists.
Implementation Method 1
selectively irradiating with actinic rays (such as ultraviolet (UV), deep UV, vacuum UV, extreme UV, x-rays, electron beams and ion beams) via a transmission or reflecting mask followed by a development treatment to selectively dissolve away the coated photosensitive layer
Implementation Method 2
The speed of the reaction can be driven, for example, by heating the resist film
Data Source
AI summary
The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III);wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.