Sulfonated Polymer Cleaning Liquid for Molybdenum CMP Defects

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Solution Overview

Problem

Existing treatment liquids for semiconductor substrates with molybdenum-containing substances after chemical mechanical polishing struggle to provide both effective anticorrosion properties and defect removability, leading to performance issues and yield reduction.

Innovation Solution

A treatment liquid comprising a polymer with sulfonic acid groups or salts, optionally with carboxy groups, and water, with specific molecular weight and molar ratios, along with optional organic acids and amino acids, is used to enhance anticorrosion properties and defect removability on molybdenum-containing substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional treatment liquids containing organic acids, sulfonic acid-type anionic surfactants, and polymer coagulating agents are used for cleaning molybdenum-containing substrates after CMP treatment, then defect removability is improved, but anticorrosion properties for molybdenum deteriorate

Engineering Contradiction:
Improvedefect removabilityVSAvoidanticorrosion properties
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent changes the chemical parameters of the treatment liquid by replacing conventional organic acids and anionic surfactants with carboxylic acid-type chelating agents having specific molecular weights (100-10,000). This parameter change enables the liquid to simultaneously achieve defect removability and anticorrosion properties for molybdenum substrates after CMP treatment

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite treatment liquid system combining carboxylic acid-type chelating agents with specific molecular weights, optional amino acids, and controlled pH ranges (2-12). This composite formulation synergistically provides both defect removal capability and corrosion protection for molybdenum-containing substrates

Inventive Principle:
Principle #40Composite materials

2Productivity

If treatment liquids are formulated to enhance defect removability on molybdenum-containing substrates, then cleaning effectiveness is improved, but corrosion of molybdenum increases

Engineering Contradiction:
Improvecleaning effectivenessVSAvoidcorrosion of molybdenum
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent introduces carboxylic acid-type chelating agents as intermediary substances that mediate between the cleaning liquid and molybdenum substrate. These chelating agents bind to metal ions and residues, enabling effective defect removal while preventing direct corrosive interaction between the liquid and molybdenum substrate

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent optimizes the molecular weight parameter of the carboxylic acid-type chelating agent (100-10,000) to achieve optimal balance between cleaning effectiveness and corrosion prevention. This parameter optimization ensures the chelating agent can effectively bind residues while maintaining protective function on the molybdenum substrate

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The treatment liquid effectively improves anticorrosion properties and defect removability on molybdenum-containing substrates, ensuring better performance and yield in semiconductor manufacturing.

Implementation Method 1

a polymer having a sulfonic acid group or a salt thereof

Methodology Applied
Scientific EffectAdsorption: Adsorption

Implementation Method 2

anticorrosion properties for molybdenum

Methodology Applied
Scientific EffectChemical protection: Chemical Bonding

Data Source

PatentUS20250346834A1Treatment liquid, cleaning method for object to be treated, and method for manufacturing electronic device
Publication Date: 2025.11.13 FUJIFILM CORP
  • US20250346834A1 patent drawing
  • US20250346834A1 patent drawing
  • US20250346834A1 patent drawing

AI summary

The present invention provides a treatment liquid which is excellent in anticorrosion properties for molybdenum and excellent in defect removability on an object to be treated, in a case of being applied to cleaning of the object to be treated, which contains a molybdenum-containing substance and has been subjected to chemical mechanical polishing treatment. In addition, the present invention provides a cleaning method for an object to be treated, using the above-described treatment liquid, and a method for manufacturing an electronic device. The treatment liquid of the present invention is used for cleaning an object to be treated, which contains a molybdenum-containing substance and has been subjected to chemical mechanical polishing, the treatment liquid containing a polymer having a sulfonic acid group or a salt thereof, and water.