Molybdenum Deposition via Halogenated Hydrocarbon Reactant
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The deposition of high-quality molybdenum thin films by cyclical methods is challenging due to molybdenum's electropositive nature and tendency to form nitride or carbide phases, necessitating alternative methods for depositing metallic molybdenum with low carbon and/or nitrogen content.
Innovation Solution
A cyclical deposition process involving a molybdenum precursor with a molybdenum atom and a hydrocarbon ligand, combined with a halogenated hydrocarbon reactant, is used to form molybdenum on a substrate, achieving predominantly elemental molybdenum deposition with controlled impurity levels.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional cyclical deposition methods are used to deposit molybdenum, then deposition process can be performed, but the molybdenum forms nitride or carbide phases due to its electropositive nature, resulting in poor film quality
Solution Approach 1:
The patent changes the chemical parameters of the deposition process by using a halogenated hydrocarbon reactant instead of conventional reactants. This parameter change prevents nitride or carbide phase formation while enabling successful cyclical deposition of molybdenum films with controlled impurity levels
Solution Approach 2:
The halogenated hydrocarbon acts as an intermediary species that facilitates the deposition of metallic molybdenum without causing harmful nitride or carbide phase formation. The halogenated hydrocarbon mediates the reaction to produce elemental molybdenum with low carbon and nitrogen content
2Manufacturing precision
If cyclical deposition methods are used to deposit molybdenum, then deposition can be performed, but high carbon and nitrogen content is incorporated into the film, reducing film quality
Solution Approach 1:
The patent modifies the chemical composition parameters by selecting a halogenated hydrocarbon reactant with specific molecular structure (at least two halogen atoms on different carbon atoms). This parameter selection controls the impurity incorporation, achieving low carbon and nitrogen content in the deposited molybdenum layer
Solution Approach 2:
The patent achieves local quality control by producing predominantly elemental molybdenum (low carbon and nitrogen content) within the deposited layer. The halogenated hydrocarbon reactant enables selective deposition that maintains high purity in the molybdenum layer while managing impurity levels
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the deposition of high-quality molybdenum layers with low resistivity and controlled impurity content, suitable for various semiconductor applications, such as BEOL, MEOL, and advanced memory devices.
Implementation Method 1
A cyclical deposition process involving a molybdenum precursor with a molybdenum atom and a hydrocarbon ligand, combined with a halogenated hydrocarbon reactant, is used to form molybdenum on a substrate
Data Source
AI summary
The current disclosure relates to methods of depositing molybdenum on a substrate. The disclosure further relates to a molybdenum layer, to a structure and to a device comprising a molybdenum layer. In the method, molybdenum is deposited on a substrate by a cyclical deposition process, and the method comprises providing a substrate in a reaction chamber, providing a molybdenum precursor to the reaction chamber in a vapor phase and providing a reactant to the reaction chamber in a vapor phase to form molybdenum on the substrate. The molybdenum precursor comprises a molybdenum atom and a hydrocarbon ligand, and the reactant comprises a hydrocarbon comprising two or more halogen atoms, and at least two halogen atoms are attached to different carbon atoms.