Monolithic 3D IC Layout Using Dense Inter-Layer Connectivity

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing CAD tools struggle to optimize the placement and routing of transistors and wires in monolithic 3D integrated circuits, as they are designed for stacked-layer processes with large Through-Silicon Vias (TSVs), failing to leverage the dense inter-layer connectivity and disparate characteristics of monolithic 3D technology.

Innovation Solution

The method involves using 2D placers and routers within CAD tools to optimize the placement and routing of transistors and wires across multiple strata in monolithic 3D integrated circuits, considering the dense inter-layer connectivity and potential differences in characteristics between layers, and incorporating partitioning and placement strategies to balance areas and improve physical proximity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Extent of automation

If existing CAD tools are used for monolithic 3D IC design, then the design process can be automated, but the tools fail to optimize placement and routing due to being designed for stacked-layer processes with large TSVs

Engineering Contradiction:
Improvedesign automationVSAvoidplacement and routing optimization
Core Design Contradiction:
Extent of automationVSManufacturing precision

Solution Approach 1:

The patent modifies the design parameters and constraints in the CAD tool to account for monolithic 3D IC characteristics, including dense inter-layer connectivity and disparate layer characteristics, rather than using parameters optimized for TSV-based stacked layers

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent applies different placement and routing strategies to different strata based on their specific characteristics, allowing each layer to be optimized according to its local requirements rather than applying a uniform approach across all layers

Inventive Principle:
Principle #3Local quality

2Productivity

If dense inter-layer connectivity is leveraged in monolithic 3D ICs, then design efficiency is improved, but existing CAD tools cannot properly utilize this connectivity due to being designed for large TSVs

Engineering Contradiction:
Improvedesign efficiencyVSAvoidinter-layer connectivity utilization
Core Design Contradiction:
ProductivityVSAdaptability or versatility

Solution Approach 1:

The patent extends the traditional 2D placement and routing approach to three dimensions by incorporating vertical connectivity between strata, allowing design tools to exploit the additional dimensional space provided by dense inter-layer connections in monolithic 3D ICs

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Length of stationary object

If partitioning and placement strategies are used to balance areas across strata, then physical proximity is improved, but the complexity of the placement process increases

Engineering Contradiction:
Improvephysical proximityVSAvoidplacement process complexity
Core Design Contradiction:
Length of stationary objectVSDevice complexity

Solution Approach 1:

The patent divides the monolithic 3D IC design into separate strata that can be independently partitioned and placed, then integrated through defined interfaces, managing complexity by breaking down the overall placement problem into smaller, more manageable segments

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20260050729A1Design automation methods for 3D integrated circuits and devices
Publication Date: 2026.02.19 MONOLITHIC 3D INC
  • US20260050729A1 patent drawing
  • US20260050729A1 patent drawing
  • US20260050729A1 patent drawing

AI summary

Methods of designing a 3D Integrated Circuit including: partitioning at least one design into at least two levels, a first level and a second level, where the first level includes first transistors, where the second level includes second transistors is on top of the first level; providing placement data of the second level; performing a placement of the first level using a placer program executed by a computer, where the placement of the first level is based on the placement data, where the placer is part of a Computer Aided Design (CAD) tool, and where the first level includes first routing layers; performing a routing of the first level using a router {part of the CAD tool or another CAD tool) executed by a computer, where at least one metal routing layer is disposed in-between the first transistors and the second transistors, and the second level includes repeating structures.