Monolithic Adsorbent via In-Situ Polymerization

The patent changes the processing parameters from mechanical high-pressure molding to chemical polymerization conditions. By controlling the polymerization of pyrrole monomers under mild chemical conditions (using oxidants like ammonium persulfate or potassium permanganate in aqueous solutions at room or elevated temperatures), the MOF structure is preserved while still achieving monolithic formation through the polymerization process that binds particles together.

The patent extracts and eliminates the harmful polymer component from the molding process. Instead of using polymer-blend molding that blocks pores, the invention uses a water-based polymerization approach where pyrrole monomers polymerize in the presence of MOF particles, forming a monolithic structure without requiring polymer additives that would block the porous structure and reduce specific surface area.

The patent employs a self-service mechanism where the pyrrole polymerization process itself provides the binding function. The polymerizing pyrrole monomers and resulting polypyrrole structure act as the binding agent, eliminating the need for separate aluminum oxide or clay additives. This self-generated binding mechanism maintains mechanical strength while preserving the full content of effective adsorption components.

The patent replaces the mechanical mixing and molding process with a chemical polymerization system. Instead of mechanically blending polymers with MOF particles (which causes agglomeration and pore blocking), the invention uses in-situ chemical polymerization of pyrrole monomers that occurs uniformly throughout the mixture, forming a monolithic granular structure that prevents particle agglomeration and maintains pore accessibility.