Monolithic Beam Correction Plates for Multi-Beam Aberration Control
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Solution Overview
Problem
Existing multi-beam particle beam systems face challenges in correcting imaging aberrations, particularly field curvature and astigmatism, with current correction methods being complex, costly, and limited in accuracy and efficiency.
Innovation Solution
The use of monolithic multi-aperture plates designed with variable aperture sizes and shapes, tailored to specific operating parameters, allows for precise correction of aberrations by applying a single correction voltage to each plate, optimizing the path trajectory of individual particle beams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional separate correction elements are used for field curvature and astigmatism, then correction coverage is comprehensive, but device complexity and production cost increase
Solution Approach 1:
The patent combines multiple correction functions (field curvature correction and astigmatism correction) into a single monolithic correction plate. The plate features apertures with different geometries (circular for field curvature, elliptical for astigmatism) integrated into one structure, eliminating the need for separate correction elements and reducing system complexity while maintaining comprehensive aberration correction capability
Solution Approach 2:
The monolithic correction plate serves multiple functions simultaneously: it corrects both field curvature and astigmatism aberrations through its integrated aperture design. The plate is universally applicable to correct various types of imaging aberrations in multi-beam particle beam systems without requiring multiple specialized components
2Device complexity
If monolithic correction plates with variable aperture geometries are used, then manufacturing precision requirements increase, but device complexity decreases
Solution Approach 1:
The correction plate implements local quality by having different aperture geometries (circular, elliptical, or other shapes) at different locations or for different beam groups. Each aperture's shape and size are locally optimized to correct specific aberrations for particular beam paths, allowing precise correction tailored to local requirements while using a single integrated plate structure
3Reliability
If more correction plates are used to cover all aberrations, then correction accuracy improves, but productivity and throughput decrease
Solution Approach 1:
The patent merges multiple correction functions into a single monolithic plate that can correct various aberrations simultaneously. This integration reduces the number of correction elements from multiple separate plates to one unified component, thereby improving system throughput and productivity while maintaining comprehensive aberration correction accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate and efficient correction of aberrations with fewer plates, simplifying production and integration into multi-beam systems, enhancing imaging quality and throughput.
Implementation Method 1
wherein exactly one settable correction voltage for generating a contribution to a path correction is applied to each of the path trajectory correction plates during operation of the multi-beam particle beam system
Data Source
AI summary
A method for designing a multi-beam particle microscope and a multi-beam particle microscope operating with a multiplicity of charged individual particle beams and imaging the latter into an object plane and comprising a plurality of path trajectory correction plates are disclosed. Each of the path trajectory correction plates has a multiplicity of apertures for the multiplicity of individual particle beams and exactly one settable correction voltage is applied to each of the path trajectory correction plates during the operation of the multi-beam particle microscope. A path trajectory correction plate is fixedly assigned to an operating parameter of the multi-beam particle microscope. When designing the path trajectory correction plates, the apertures in the path trajectory correction plates are adapted in view of shape and size such that operating parameter-related path deviations of all individual particle beams can be corrected.