Monolithic Gas Manifold for Flexible Semiconductor Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current gas manifold systems for semiconductor wafer processing are inflexible and costly, with increased complexity leading to unpredictable performance, difficulty in cleaning, and decreased wafer throughput due to complex tube connections and dead spaces, making them unsuitable for delivering varied gas mixtures and flow rates to multiple processing stations effectively.
Innovation Solution
A gas manifold system with a plurality of gas distribution ducts and mixing conduits that allow for the independent distribution and mixing of source gases to generate multiple gas mixtures with different compositions and flow rates, using a grooved block design with interconnected grooves to form gas mixing conduits and distribution ducts, minimizing the use of welded and threaded joints for improved flexibility and predictability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If complex tube connections and welded joints are used to deliver varied gas mixtures to multiple processing stations, then gas delivery flexibility is improved, but system complexity increases and performance becomes unpredictable
Solution Approach 1:
The gas manifold system is divided into multiple independent mixing regions, each capable of generating separate gas mixtures. These segmented regions are integrated into a single monolithic structure, allowing flexible gas delivery to multiple processing stations while maintaining predictable flow characteristics through the integrated design.
Solution Approach 2:
Multiple gas mixing conduits and distribution ducts are merged into a single monolithic gas manifold structure. This integration eliminates the need for separate tube connections and welded joints between components, reducing system complexity while maintaining the ability to deliver varied gas mixtures to multiple stations.
2Adaptability or versatility
If complex tube connections and welded joints are used to deliver varied gas mixtures, then gas delivery flexibility is improved, but cleaning difficulty increases
Solution Approach 1:
The gas manifold integrates multiple mixing conduits and distribution ducts into a single monolithic structure with no internal welded joints or threaded connections. This design eliminates hard-to-reach areas and dead spaces where contaminants could accumulate, making the entire system easily cleanable while maintaining flexible gas delivery capability.
3Adaptability or versatility
If complex tube connections and welded joints are used, then gas delivery flexibility is improved, but wafer throughput decreases due to dead spaces
Solution Approach 1:
The monolithic gas manifold structure integrates all gas mixing and distribution functions into a single piece with smooth, continuous flow paths. This eliminates dead spaces and trapped volumes that would otherwise slow gas flow and delay process transitions, thereby increasing wafer throughput while maintaining the ability to deliver varied gas mixtures to multiple stations.
4Adaptability or versatility
If multiple welded and threaded joints are used, then gas distribution capability is improved, but cost increases
Solution Approach 1:
The gas manifold combines multiple mixing conduits and distribution ducts into a single monolithic structure that can be manufactured as one integrated component. This eliminates the need for expensive welding and threading operations on multiple separate parts, reducing manufacturing cost while maintaining full gas distribution capability to multiple processing stations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system provides efficient and flexible delivery of gas mixtures with reduced complexity, improved cleaning ease, and increased wafer throughput by eliminating dead spaces and enhancing gas mixing, while maintaining cost-effectiveness and predictability of gas flow characteristics.
Implementation Method 1
a gas mixing section including a plurality of separate gas mixture flow paths... operable to mix a plurality of source gases in each of the plurality of separate gas mixture flow paths to generate a plurality of separate gas mixtures
Implementation Method 2
a gas mixing section including a plurality of separate gas mixture flow paths... operable to mix a plurality of source gases in each of the plurality of separate gas mixture flow paths
Data Source
AI summary
Each of plurality of gas sources flows to a different one of a plurality of separate source gas flow paths. Then, a source gas is distributed directly from each of plurality of separate source gas flow paths to a plurality of separate gas mixture flow paths, thereby distributing a plurality of source gases to each of different flow paths. A plurality of separate gas mixture streams is generated by flowing a plurality of source gases in each of a plurality of separate gas mixture flow paths. In some embodiments, each of a plurality of separate source gas flow paths comprises a gas distribution duct, and each of a plurality of gas mixture flow paths comprises a gas mixing conduit. In some embodiments, a gas distribution duct includes a plurality of gas distribution ports and a gas source port connectable to a gas source. In some embodiments, a gas mixing conduit comprises a plurality of gas inlet holes, a gas mixing region, and a gas outlet hole. Each of the gas inlet holes is connectable to a gas distribution duct and is operable to conduct a source gas into the gas mixing region. A plurality of gases is mixed in the mixing region to form a gas mixture. A gas manifold is operable to mix a plurality of source gases in a plurality of gas mixing conduits to generate a plurality of gas mixtures having different gas compositions and flow rates.