Monolithic Interferometric Plate with Partially Resonant Cavity
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Solution Overview
Problem
Current two-wave interferometric devices are sensitive to the angular size of the observed source, difficult to manufacture robustly, and not suitable for large-scale industrial production due to their sensitivity to thermal cycles and the need for precise machining, which limits their robustness and miniaturization.
Innovation Solution
A two-wave Fourier transform spectrometer with a monolithic interferometric device made from non-deformable, transparent materials like quartz or germanium, featuring a partially resonant full cavity with controlled reflection coefficients, which is robust to thermal cycles and angular size variations, and can be miniaturized without using converging lenses.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If highly reflective surfaces (R>90%) are used to form optical cavities with high fineness, then measurement precision is improved, but manufacturing complexity and cost increase, and the device becomes more delicate and sensitive to environmental factors
Solution Approach 1:
The invention changes the key parameter from high reflection coefficient (R>90%) to moderate reflection coefficient (R<70%), thereby transitioning from multi-wave to two-wave interference. This parameter change reduces manufacturing complexity and increases robustness while maintaining spectral measurement capability through modified interference conditions
Solution Approach 2:
The invention replaces expensive, delicate highly reflective surfaces with more robust, easier-to-manufacture surfaces having moderate reflectivity. These simpler surfaces are less sensitive to defects and particles, making the device more suitable for industrial production and everyday use
2Measurement precision
If precise machining is performed to achieve desired resolution, then measurement precision is improved, but manufacturing robustness deteriorates due to sensitivity to thermal cycles and handling
Solution Approach 1:
The invention changes the interference mechanism from multi-wave (requiring extremely precise cavity spacing) to two-wave interference. This allows moderate machining precision to achieve desired spectral resolution, significantly improving robustness to thermal expansion and handling while maintaining measurement capability
Solution Approach 2:
The invention segments the interference process into two distinct waves (direct and single-reflected) rather than relying on multiple reflections. This segmentation reduces sensitivity to cavity dimension variations and improves thermal stability
3Measurement precision
If multi-wave interferometric devices are used to achieve high fineness, then spectral analysis precision is improved, but device miniaturization becomes difficult due to delicate structure and handling requirements
Solution Approach 1:
The invention changes from multi-wave to two-wave interference by modifying the reflection coefficient parameter. This enables device miniaturization because two-wave interference is less sensitive to cavity dimension precision, allowing smaller, more compact designs that are easier to handle and integrate
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a robust, miniaturized, and cost-effective two-wave interferometric device that is less sensitive to thermal cycles and angular size, enabling precise spectral analysis with improved manufacturing efficiency and reduced dimensions.
Implementation Method 1
The superposition of these beams inside or outside the interferometric device forms an interference pattern in a localization plane
Implementation Method 2
a cavity with two parallel, facing reflective surfaces. The average reflection coefficient R of these surfaces is typically greater than 90%
Data Source
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AI summary
Two-wave interferometric device, making it possible to obtain an interference pattern of a light source (S), whose light passes through the device, comprising: - a dephasing layer (A) made of a first material (1), of optical index nA, comprising a first face (A1) and a second face (A2) opposite one another, said first face (A1) comprising at least one element or surface not parallel to said second face (A2); - a support layer (B) made of a second material (2), of optical index nB differing from the optical index nA, comprising a first face (B1) opposite and parallel to a second face (B2); - the second face (A2) of the dephasing layer (A) and the second face (B2) of the support layer (B) being joined, in such a way as to form a monolithic interferometric plate (LM).