Monolithic Microwave Source Array With Integrated Temperature Control
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Solution Overview
Problem
High-frequency plasma sources with discrete applicators often result in plasma non-uniformities and suboptimal injection of electromagnetic radiation due to assembly variations, manufacturing tolerances, and degradation, leading to inefficient processing conditions in semiconductor manufacturing.
Innovation Solution
A monolithic source array with integrated temperature control, where a dielectric plate and protrusions are fabricated as a single part, eliminating the physical interface between the applicator and dielectric plate, and incorporating a housing with thermal fluid channels and embedded heaters for uniform temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If discrete applicators are used with dielectric plates, then assembly flexibility is improved, but plasma uniformity deteriorates due to manufacturing tolerances and assembly variations
Solution Approach 1:
The applicator and dielectric plate are merged into a single monolithic structure formed from a single block of dielectric material. This integration eliminates the physical interface and associated manufacturing tolerances between separate components, thereby improving plasma uniformity while maintaining the functional capabilities of discrete applicators
2Reliability
If applicators are positioned over or within the dielectric plate, then coupling with chamber interior is reduced, but plasma generation efficiency deteriorates
Solution Approach 1:
The applicator protrusions are integrated directly into the dielectric plate as a monolithic structure, eliminating the interface between separate components. This integration optimizes electromagnetic radiation coupling into the chamber interior while the dielectric material provides inherent protection to the applicator elements
3Productivity
If applicators are exposed to plasma environment, then plasma generation capability is improved, but applicator degradation accelerates
Solution Approach 1:
The applicator and dielectric plate are formed as a single monolithic structure where the dielectric material provides inherent protection to the applicator elements. This integrated structure allows the applicator to be exposed to the plasma environment for effective plasma generation while the unified dielectric structure reduces degradation compared to separate component configurations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures improved plasma uniformity and enhanced coupling of high-frequency electromagnetic radiation, maintaining tight machining tolerances and providing precise temperature control, which is critical for processes like ALD and CVD.
Implementation Method 1
incorporating a housing with thermal fluid channels and embedded heaters for uniform temperature control
Implementation Method 2
a housing with thermal fluid channels and embedded heaters for uniform temperature control
Implementation Method 3
enhanced coupling of high-frequency electromagnetic radiation
Data Source
AI summary
Embodiments disclosed herein include a housing for a source assembly. In an embodiment, the housing comprises a conductive body with a first surface and a second surface opposite from the first surface, and a plurality of openings through a thickness of the conductive body between the first surface and the second surface. In an embodiment, the housing further comprises a channel into the first surface of the conductive body, and a cover over the channel. In an embodiment, a first stem over the cover extends away from the first surface, and a second stem over the cover extends away from the first surface. In an embodiment, the first stem and the second stem open into the channel.