Monomer-Based Resist Composition for High-Resolution Patterning

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Solution Overview

Problem

Current methods for producing β-(meth)acryloyloxy-γ-butyrolactone compounds face challenges such as stability, handling difficulties, high costs, and the need for special reactor setups, making large-scale industrial production inefficient.

Innovation Solution

A method involving the rearrangement of (meth)acryloyloxy groups to prepare β-(meth)acryloyloxy-γ-butyrolactone and β-(meth)acryloyloxy-γ-valerolactone compounds in high yields without forming intermediates like β-hydroxylactone or β-halolactone, using metal enolate reagents and acyloxyketone compounds, which can be used to create a monomer for improved resist compositions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conventional methods are used to produce β-(meth)acryloyloxy-γ-butyrolactone compounds, then the compounds can be produced, but the production process suffers from stability issues, handling difficulties, high costs, and requires special reactor setups

Engineering Contradiction:
Improveease of productionVSAvoidstability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent changes the reaction parameters by using a one-pot two-step process that converts the intermediate directly in situ without isolation. The reaction conditions are optimized to maintain stability while improving ease of manufacture by eliminating the need for special reactor setups and complex handling procedures

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent extracts the problematic intermediate isolation step from the production process. By eliminating the need to isolate and handle β-hydroxylactone or β-halolactone intermediates, the method removes the sources of instability and handling difficulties while maintaining product quality

Inventive Principle:
Principle #2Taking out (Extraction)

2Productivity

If conventional multi-step methods with intermediate isolation are used, then the production process is established, but the process becomes complex, costly, and less efficient for large-scale production

Engineering Contradiction:
Improveproduction efficiencyVSAvoidprocess complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent merges the intermediate formation and conversion steps into a single continuous process. The β-hydroxylactone or β-halolactone intermediate is converted in situ to the final β-(meth)acryloyloxy-γ-butyrolactone product without isolation, thereby combining multiple operations into one streamlined process that improves productivity while reducing complexity

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent performs preliminary preparation of the intermediate within the same reaction system that will subsequently convert it to the final product. This preliminary action is integrated into the overall process rather than being a separate step, reducing both equipment complexity and production time

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resulting monomer-based resist composition exhibits enhanced performance with improved dissolution contrast, acid diffusion control, and reduced roughness in both alkaline and organic solvent developments, suitable for high-resolution pattern formation.

Implementation Method 1

reacting a compound having the general formula (9) with a base or a metal selected from Group 1A, 2A and 2B metals to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound having the general formula (8)

Methodology Applied
Scientific EffectNucleophilic addition: Chemical Bonding

Data Source

PatentUS9458144B2Monomer, polymer, resist composition, and patterning process
Publication Date: 2016.10.04 SHIN ETSU CHEMICAL CO LTD
  • US9458144B2 patent drawing
  • US9458144B2 patent drawing
  • US9458144B2 patent drawing

AI summary

A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.