Mother Substrate Assembly Mask Merging for In-Cell Reflective Polarizer
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Solution Overview
Problem
The existing methods for manufacturing mother substrate assemblies, particularly those incorporating in-cell reflective polarizers, require multiple masks, increasing the complexity and cost of the process.
Innovation Solution
A method that forms a metal nanowire on a transparent substrate using a halftone or slit mask to create a metal nanowire pattern simultaneously with the align key, reducing the number of masks needed by using a combination of photoresist layers and copolymer layers to achieve the desired nano-grid pattern for polarizing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple masks are used to manufacture the mother substrate assembly, then the alignment precision and manufacturing precision are improved, but the device complexity and manufacturing cost increase
Solution Approach 1:
The patent combines multiple mask functions into a single mask structure. The mask includes a first mask portion for forming the reflective polarizer pattern and a second mask portion for forming the align key pattern, allowing simultaneous patterning of multiple features that traditionally required separate masks, thereby reducing device complexity while maintaining precision
Solution Approach 2:
The single mask serves multiple functions: it acts as both the reflective polarizer pattern mask and the align key pattern mask. This multi-functional mask design eliminates the need for multiple specialized masks, reducing manufacturing steps and complexity while maintaining the required alignment precision through integrated pattern design
2Manufacturing precision
If multiple masks are used to manufacture the mother substrate assembly, then the manufacturing precision is improved, but the manufacturing time and productivity are reduced
Solution Approach 1:
The patent merges multiple patterning operations into a single exposure step using a multi-functional mask. This allows the reflective polarizer pattern and align key pattern to be formed simultaneously in one manufacturing cycle, eliminating sequential mask alignment steps and significantly improving manufacturing throughput while maintaining patterning precision
3Device complexity
If a single mask is used to form both reflective polarizer and align key, then the device complexity is reduced, but the manufacturing precision may be compromised
Solution Approach 1:
The single mask is segmented into distinct functional portions: a first mask portion with features for the reflective polarizer and a second mask portion with features for the align key. This segmentation allows each portion to be optimized for its specific function while maintaining overall pattern accuracy through precise relative positioning of the mask segments
Solution Approach 2:
Different regions of the mask are designed with locally optimized characteristics. The first mask portion has features sized and spaced for reflective polarizer formation, while the second mask portion has features optimized for align key formation. This local quality approach ensures each pattern type achieves its required precision despite using a single integrated mask structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process by reducing the number of masks required, enhancing polarizing efficiency and viewing angle while maintaining high transmittance, thus lowering production costs and complexity.
Implementation Method 1
heat-treating or solvent-annealing the copolymer layer to alternately arrange the first and second polymers in the display area
Implementation Method 2
performing an anisotropic etching process on the barrier layer to form barrier walls disposed along a sidewall of the bar pattern
Implementation Method 3
etching the metal layer using the barrier walls and the protruding bars as a mask
Data Source
AI summary
A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.